Inventor
TAGAMI SHOHEI
JP33 patents
⚠️ This page may combine multiple inventors who share the name “TAGAMI SHOHEI”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
SHINETSU CHEMICAL CO
26 patentsUS8715905B2May 6, 2014
Silphenylene-containing photocurable composition, pattern formation method using same, and optical semiconductor element obtained using the method
SHINETSU CHEMICAL CO24 citations92
US10128143B2Nov 13, 2018
Wafer processing laminate, temporary adhesive material for wafer processing, and method for manufacturing thin wafer
SHINETSU CHEMICAL CO9 citations84
US9646868B2May 9, 2017
Wafer temporary bonding method and thin wafer manufacturing method
SHINETSU CHEMICAL CO7 citations84
US8999817B2Apr 7, 2015
Wafer process body, wafer processing member, wafer processing temporary adhesive material, and method for manufacturing thin wafer
SHINETSU CHEMICAL CO7 citations84
US7638259B2Dec 29, 2009
Polyimide resin soluble in aqueous alkaline solution, composition comprising the resin and cured coating prepared from the composition
SHINETSU CHEMICAL CO8 citations84
US10242902B2Mar 26, 2019
Wafer processing laminate, temporary adhesive material for wafer processing, and method for manufacturing thin wafer
SHINETSU CHEMICAL CO2 citations73
US10115622B2Oct 30, 2018
Wafer processing laminate and method for processing wafer
SHINETSU CHEMICAL CO2 citations73
US9934996B2Apr 3, 2018
Wafer processing bonding arrangement, wafer laminate, and thin wafer manufacturing method
SHINETSU CHEMICAL CO5 citations73
US9263333B2Feb 16, 2016
Wafer processing laminate, wafer processing member, temporary adhering material for processing wafer, and manufacturing method of thin wafer
SHINETSU CHEMICAL CO4 citations73
US9096032B2Aug 4, 2015
Wafer processing laminate, wafer processing member, temporary bonding arrangement, and thin wafer manufacturing method
SHINETSU CHEMICAL CO2 citations63
US8735264B2May 27, 2014
Temporary adhesive composition and method for manufacturing thin wafer using the same
SHINETSU CHEMICAL CO2 citations63
US7781541B2Aug 24, 2010
Polyimide silicone resin and thermosetting composition comprising the same
SHINETSU CHEMICAL CO3 citations63
US12187989B2Jan 7, 2025
Cleaning solution for temporary adhesive for substrates, substrate cleaning method, and cleaning method for support or substrate
SHINETSU CHEMICAL CO0 citations62
US10991611B2Apr 27, 2021
Wafer processing laminate and method for processing wafer
SHINETSU CHEMICAL CO0 citations62
US11970639B2Apr 30, 2024
Temporary adhesive for wafer processing, wafer laminate and method for producing thin wafer
SHINETSU CHEMICAL CO0 citations60
US10106713B2Oct 23, 2018
Wafer processing laminate, temporary adhesive material for wafer processing, and method for manufacturing thin wafer
SHINETSU CHEMICAL CO1 citations52
US9887118B2Feb 6, 2018
Wafer processing laminate, temporary adhesive material for wafer processing, and method for manufacturing thin wafer
SHINETSU CHEMICAL CO0 citations52
US9472438B2Oct 18, 2016
Wafer processing laminate, wafer processing member, temporary adhering material for processing wafer, and manufacturing method of thin wafer
SHINETSU CHEMICAL CO1 citations52
US9365681B2Jun 14, 2016
Wafer processing laminate, wafer processing member, temporary bonding arrangement, and thin wafer manufacturing method
SHINETSU CHEMICAL CO1 citations52
US9334424B2May 10, 2016
Temporary adhesive for wafer processing, member for wafer processing using the same, wafer processed body, and method for producing thin wafer
SHINETSU CHEMICAL CO1 citations52
US9458365B2Oct 4, 2016
Temporary bonding adhesive compositions and methods of manufacturing a semiconductor device using the same
SHINETSU CHEMICAL CO1 citations51
US8048978B2Nov 1, 2011
Silphenylene compound and process for producing the same
SHINETSU CHEMICAL CO0 citations51
US12322637B2Jun 3, 2025
Wafer processing laminate, temporary adhesive material for wafer processing, and method for manufacturing thin wafer
SHINETSU CHEMICAL CO0 citations50
US10854496B2Dec 1, 2020
Circuit substrate processing laminate and method for processing circuit substrate
SHINETSU CHEMICAL CO0 citations42
US10147632B2Dec 4, 2018
Wafer processing laminate, temporary adhesive material for wafer processing, and method for manufacturing thin wafer
SHINETSU CHEMICAL CO0 citations42
US9063421B2Jun 23, 2015
Chemically amplified positive resist composition and pattern forming process
SHINETSU CHEMICAL CO0 citations42
FURUYA MASAHIRO
3 patentsUS8673537B2Mar 18, 2014
Photo-curable resin composition, pattern forming method and substrate protecting film, and film-shaped adhesive and adhesive sheet using said composition
FURUYA MASAHIRO4 citations71
US8785585B2Jul 22, 2014
Temporary adhesive composition, and method of producing thin wafer
FURUYA MASAHIRO2 citations61
US8748293B2Jun 10, 2014
Organopolysiloxane, temporary adhesive composition containing organopolysiloxane, and method of producing thinned wafer using the same
FURUYA MASAHIRO1 citations51