P

Inventor

TAGAMI SHOHEI

JP33 patents
⚠️ This page may combine multiple inventors who share the name “TAGAMI SHOHEI”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

SHINETSU CHEMICAL CO

26 patents
US8715905B2May 6, 2014

Silphenylene-containing photocurable composition, pattern formation method using same, and optical semiconductor element obtained using the method

SHINETSU CHEMICAL CO24 citations92
US10128143B2Nov 13, 2018

Wafer processing laminate, temporary adhesive material for wafer processing, and method for manufacturing thin wafer

SHINETSU CHEMICAL CO9 citations84
US9646868B2May 9, 2017

Wafer temporary bonding method and thin wafer manufacturing method

SHINETSU CHEMICAL CO7 citations84
US8999817B2Apr 7, 2015

Wafer process body, wafer processing member, wafer processing temporary adhesive material, and method for manufacturing thin wafer

SHINETSU CHEMICAL CO7 citations84
US7638259B2Dec 29, 2009

Polyimide resin soluble in aqueous alkaline solution, composition comprising the resin and cured coating prepared from the composition

SHINETSU CHEMICAL CO8 citations84
US10242902B2Mar 26, 2019

Wafer processing laminate, temporary adhesive material for wafer processing, and method for manufacturing thin wafer

SHINETSU CHEMICAL CO2 citations73
US10115622B2Oct 30, 2018

Wafer processing laminate and method for processing wafer

SHINETSU CHEMICAL CO2 citations73
US9934996B2Apr 3, 2018

Wafer processing bonding arrangement, wafer laminate, and thin wafer manufacturing method

SHINETSU CHEMICAL CO5 citations73
US9263333B2Feb 16, 2016

Wafer processing laminate, wafer processing member, temporary adhering material for processing wafer, and manufacturing method of thin wafer

SHINETSU CHEMICAL CO4 citations73
US9096032B2Aug 4, 2015

Wafer processing laminate, wafer processing member, temporary bonding arrangement, and thin wafer manufacturing method

SHINETSU CHEMICAL CO2 citations63
US8735264B2May 27, 2014

Temporary adhesive composition and method for manufacturing thin wafer using the same

SHINETSU CHEMICAL CO2 citations63
US7781541B2Aug 24, 2010

Polyimide silicone resin and thermosetting composition comprising the same

SHINETSU CHEMICAL CO3 citations63
US12187989B2Jan 7, 2025

Cleaning solution for temporary adhesive for substrates, substrate cleaning method, and cleaning method for support or substrate

SHINETSU CHEMICAL CO0 citations62
US10991611B2Apr 27, 2021

Wafer processing laminate and method for processing wafer

SHINETSU CHEMICAL CO0 citations62
US11970639B2Apr 30, 2024

Temporary adhesive for wafer processing, wafer laminate and method for producing thin wafer

SHINETSU CHEMICAL CO0 citations60
US10106713B2Oct 23, 2018

Wafer processing laminate, temporary adhesive material for wafer processing, and method for manufacturing thin wafer

SHINETSU CHEMICAL CO1 citations52
US9887118B2Feb 6, 2018

Wafer processing laminate, temporary adhesive material for wafer processing, and method for manufacturing thin wafer

SHINETSU CHEMICAL CO0 citations52
US9472438B2Oct 18, 2016

Wafer processing laminate, wafer processing member, temporary adhering material for processing wafer, and manufacturing method of thin wafer

SHINETSU CHEMICAL CO1 citations52
US9365681B2Jun 14, 2016

Wafer processing laminate, wafer processing member, temporary bonding arrangement, and thin wafer manufacturing method

SHINETSU CHEMICAL CO1 citations52
US9334424B2May 10, 2016

Temporary adhesive for wafer processing, member for wafer processing using the same, wafer processed body, and method for producing thin wafer

SHINETSU CHEMICAL CO1 citations52
US9458365B2Oct 4, 2016

Temporary bonding adhesive compositions and methods of manufacturing a semiconductor device using the same

SHINETSU CHEMICAL CO1 citations51
US8048978B2Nov 1, 2011

Silphenylene compound and process for producing the same

SHINETSU CHEMICAL CO0 citations51
US12322637B2Jun 3, 2025

Wafer processing laminate, temporary adhesive material for wafer processing, and method for manufacturing thin wafer

SHINETSU CHEMICAL CO0 citations50
US10854496B2Dec 1, 2020

Circuit substrate processing laminate and method for processing circuit substrate

SHINETSU CHEMICAL CO0 citations42
US10147632B2Dec 4, 2018

Wafer processing laminate, temporary adhesive material for wafer processing, and method for manufacturing thin wafer

SHINETSU CHEMICAL CO0 citations42
US9063421B2Jun 23, 2015

Chemically amplified positive resist composition and pattern forming process

SHINETSU CHEMICAL CO0 citations42

FURUYA MASAHIRO

3 patents

SUGO MICHIHIRO

2 patents

KATO HIDETO

1 patent

TAGAMI SHOHEI

1 patent