Inventor

TANABE MASAHITO

JP29 patents

⚠️ This page may combine multiple inventors who share the name “TANABE MASAHITO”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

TANABE MASAHITO

SHINETSU CHEMICAL CO

Wafer processing laminate, temporary adhesive material for wafer processing, and method for manufacturing thin wafer

Wafer temporary bonding method and thin wafer manufacturing method

Wafer processing laminate, temporary adhesive material for wafer processing, and method for manufacturing thin wafer

Wafer processing temporary bonding arrangement, wafer processing laminate, and thin wafer manufacturing method

Wafer processing bonding arrangement, wafer laminate, and thin wafer manufacturing method

Temporary adhesion method and method for producing thin wafer

Wafer processing laminate, wafer processing member, temporary adhering material for processing wafer, and manufacturing method of thin wafer

Cleaning solution for temporary adhesive for substrates, substrate cleaning method, and cleaning method for support or substrate

Detergent composition, substrate cleaning method, and cleaning method for support or substrate

Method for manufacturing laminate and method for manufacturing substrate

Method for manufacturing thin substrate

Temporary adhesive film roll for substrate processing, method for manufacturing thin wafer

Wafer processing laminate, temporary adhesive material for wafer processing, and method for manufacturing thin wafer

Temporary adhesive for wafer processing, member for wafer processing using the same, wafer processed body, and method for producing thin wafer

Wafer processing laminate, temporary adhesive material for wafer processing, and method for manufacturing thin wafer

TOKYO OHKA KOGYO CO LTD

Photoresist stripping liquid compositions and a method of stripping photoresists using the same

Remover solution composition for resist and method for removing resist using the same

Process for treating a lithographic substrate and a rinse solution for the treatment

Post-ashing treating liquid compositions and a process for treatment therewith

Substrate treatment method

Remover solution composition for resist and method for removing resist using the same

Liquid coating composition for use in forming antireflective film and photoresist material using said antireflective film

Photoresist stripping liquid compositions and a method of stripping photoresists using the same

Photoresist stripping liquid compositions and a method of stripping photoresists using the same

Post-ashing treating method for substrates

Photoresist stripping liquid composition and a method of stripping photoresists using the same

Coating solution for forming antireflective coating film

TOKYO OHIKA KOGYO CO LTD

Rinsing solution for lithography and method for processing substrate with the use of the same

TOPPAN PRINTING CO LTD

Reflective mask blank and reflective mask, and methods for manufacturing reflective mask blank and reflective mask