Inventor
VAN VEEN ALEXANDER HENDRIK VINCENT
NL27 patents
⚠️ This page may combine multiple inventors who share the name “VAN VEEN ALEXANDER HENDRIK VINCENT”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
WIELAND MARCO JAN-JACO
12 patentsUS8618496B2Dec 31, 2013
Charged particle system comprising a manipulator device for manipulation of one or more charged particle beams
WIELAND MARCO JAN-JACO38 citations91
US8653485B2Feb 18, 2014
Projection lens arrangement
WIELAND MARCO JAN-JACO13 citations84
US8502176B2Aug 6, 2013
Imaging system
WIELAND MARCO JAN-JACO8 citations84
US8445869B2May 21, 2013
Projection lens arrangement
WIELAND MARCO JAN-JACO12 citations84
US8558196B2Oct 15, 2013
Charged particle lithography system with aperture array cooling
WIELAND MARCO JAN-JACO11 citations83
US8492731B2Jul 23, 2013
Charged particle multi-beamlet lithography system with modulation device
WIELAND MARCO JAN-JACO9 citations83
US8604411B2Dec 10, 2013
Charged particle beam modulator
WIELAND MARCO JAN-JACO6 citations72
US8921758B2Dec 30, 2014
Modulation device and charged particle multi-beamlet lithography system using the same
WIELAND MARCO JAN-JACO4 citations71
US8841636B2Sep 23, 2014
Modulation device and charged particle multi-beamlet lithography system using the same
WIELAND MARCO JAN-JACO2 citations62
USRE44908EMay 27, 2014
Electron beam exposure system
WIELAND MARCO JAN-JACO1 citations62
USRE45049EJul 29, 2014
Electron beam exposure system
WIELAND MARCO JAN-JACO0 citations51
USRE44240EMay 28, 2013
Electron beam exposure system
WIELAND MARCO JAN-JACO0 citations51
ASML NETHERLANDS BV
8 patentsUS11101099B2Aug 24, 2021
Charged particle blocking element, exposure apparatus comprising such an element, and method for using such an exposure apparatus
ASML NETHERLANDS BV4 citations69
US12387903B2Aug 12, 2025
Aberration correction in charged particle system
ASML NETHERLANDS BV0 citations62
US11961627B2Apr 16, 2024
Vacuum chamber arrangement for charged particle beam generator
ASML NETHERLANDS BV0 citations62
US11705252B2Jul 18, 2023
Vacuum chamber arrangement for charged particle beam generator
ASML NETHERLANDS BV0 citations62
US11348756B2May 31, 2022
Aberration correction in charged particle system
ASML NETHERLANDS BV1 citations62
US11094426B2Aug 17, 2021
Vacuum chamber arrangement for charged particle beam generator
ASML NETHERLANDS BV0 citations62
US12327707B2Jun 10, 2025
Charged particle blocking element, exposure apparatus comprising such an element, and method for using such an exposure apparatus
ASML NETHERLANDS BV0 citations58
US10586625B2Mar 10, 2020
Vacuum chamber arrangement for charged particle beam generator
ASML NETHERLANDS BV0 citations51
MAPPER LITHOGRAPHY IP BV
4 patentsUS8890094B2Nov 18, 2014
Projection lens arrangement
MAPPER LITHOGRAPHY IP BV6 citations73
US10037864B2Jul 31, 2018
High voltage shielding and cooling in a charged particle beam generator
MAPPER LITHOGRAPHY IP BV3 citations72
US9653261B2May 16, 2017
Charged particle lithography system and beam generator
MAPPER LITHOGRAPHY IP BV2 citations72
US8759787B2Jun 24, 2014
Charged particle multi-beamlet lithography system with modulation device
MAPPER LITHOGRAPHY IP BV0 citations52
VAN VEEN ALEXANDER HENDRIK VINCENT
2 patentsUS11728123B2Aug 15, 2023
Charged particle blocking element, exposure apparatus comprising such an element, and method for using such an exposure apparatus
VAN VEEN ALEXANDER HENDRIK VINCENT2 citations65
US9208989B2Dec 8, 2015
Lithography system and method of refracting
VAN VEEN ALEXANDER HENDRIK VINCENT0 citations43