Inventor

JONCKHEERE RIK

BE5 patents

⚠️ This page may combine multiple inventors who share the name “JONCKHEERE RIK”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

IMEC VZW

2 patents

US10353284B2Jul 16, 2019

Lithographic reticle system

IMEC VZW2 citations69

US10359694B2Jul 23, 2019

Lithographic mask for EUV lithography

IMEC VZW0 citations43

IMEC

2 patents

US7750319B2Jul 6, 2010

Method and system for measuring contamination of a lithographical element

IMEC6 citations57

US8006202B2Aug 23, 2011

Systems and methods for UV lithography

IMEC1 citations48

JONCKHEERE RIK

1 patent

US9086638B2Jul 21, 2015

Detection of contamination in EUV systems

JONCKHEERE RIK1 citations41