Inventor
SUN JONGWOO
KR20 patents
Patents
20 patentsUS11264291B2Mar 1, 2022
Sensor device and etching apparatus having the same
SAMSUNG ELECTRONICS CO LTD9 citations79
US11348760B2May 31, 2022
Plasma processing apparatus and method of manufacturing semiconductor device using the same
SAMSUNG ELECTRONICS CO LTD2 citations70
US10892145B2Jan 12, 2021
Substrate processing apparatus, substrate processing method, and method of fabricating semiconductor device using the same
SAMSUNG ELECTRONICS CO LTD1 citations61
US11092495B2Aug 17, 2021
Optical emission spectroscopy system, method of calibrating the same, and method of fabricating semiconductor device
SAMSUNG ELECTRONICS CO LTD1 citations60
US12068140B2Aug 20, 2024
Method and system for monitoring substrate processing apparatus
SAMSUNG ELECTRONICS CO LTD0 citations59
US11215506B2Jan 4, 2022
Substrate processing apparatus, substrate processing module, and semiconductor device fabrication method
SAMSUNG ELECTRONICS CO LTD0 citations59
US10935429B2Mar 2, 2021
Substrate processing apparatus, substrate processing module, and semiconductor device fabrication method
SAMSUNG ELECTRONICS CO LTD0 citations59
US11715628B2Aug 1, 2023
Method of forming plasma processing apparatus, related apparatus, and method of forming semiconductor device using the same
SAMSUNG ELECTRONICS CO LTD0 citations56
US12211672B2Jan 28, 2025
Apparatus and method for plasma etching
SAMSUNG ELECTRONICS CO LTD0 citations55
US11984304B2May 14, 2024
Apparatus and method for plasma etching
SAMSUNG ELECTRONICS CO LTD0 citations55
US10643858B2May 5, 2020
Method of etching substrate
SAMSUNG ELECTRONICS CO LTD1 citations52
US11862440B2Jan 2, 2024
Semiconductor processing equipment including electrostatic chuck for plasma processing
SAMSUNG ELECTRONICS CO LTD0 citations50
US10431432B2Oct 1, 2019
Plasma treatment system including cover plate to insulate window
SAMSUNG ELECTRONICS CO LTD0 citations49
US12087554B2Sep 10, 2024
Substrate treating apparatus and substrate treating system having the same
SAMSUNG ELECTRONICS CO LTD0 citations48
US11929239B2Mar 12, 2024
Plasma processing apparatus and semiconductor device manufacturing method using the same
SAMSUNG ELECTRONICS CO LTD0 citations47
US11450545B2Sep 20, 2022
Capacitively-coupled plasma substrate processing apparatus including a focus ring and a substrate processing method using the same
SAMSUNG ELECTRONICS CO LTD0 citations47
US11430679B2Aug 30, 2022
Semiconductor manufacturing apparatus
SAMSUNG ELECTRONICS CO LTD0 citations47
US12315703B2May 27, 2025
Plasma processing apparatus and methods of manufacturing semiconductor device using the same
SAMSUNG ELECTRONICS CO LTD0 citations46
US11251022B2Feb 15, 2022
Gas supply assembly and substrate processing apparatus including the same
SAMSUNG ELECTRONICS CO LTD0 citations45
US10861724B2Dec 8, 2020
Substrate inspection apparatus and substrate processing system including the same
SAMSUNG ELECTRONICS CO LTD0 citations45