Inventor
FONSECA CARLOS A
US30 patents
⚠️ This page may combine multiple inventors who share the name “FONSECA CARLOS A”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
IBM
16 patentsUS6777147B1Aug 17, 2004
Method for evaluating the effects of multiple exposure processes in lithography
IBM86 citations97
US6964032B2Nov 8, 2005
Pitch-based subresolution assist feature design
IBM26 citations92
US6901576B2May 31, 2005
Phase-width balanced alternating phase shift mask design
IBM26 citations92
US6757886B2Jun 29, 2004
Alternating phase shift mask design with optimized phase shapes
IBM23 citations92
US6609245B2Aug 19, 2003
Priority coloring for VLSI designs
IBM24 citations92
US6795961B2Sep 21, 2004
Priority coloring for VLSI designs
IBM13 citations84
US11775655B2Oct 3, 2023
Risk assessment of a container build
IBM3 citations73
US11334333B1May 17, 2022
Generation of adaptive configuration files to satisfy compliance
IBM3 citations73
US11520564B2Dec 6, 2022
Intelligent recommendations for program code
IBM2 citations72
US9615259B2Apr 4, 2017
Pushing secure notifications to mobile computing devices
IBM3 citations72
US9253644B2Feb 2, 2016
Pushing secure notifications to mobile computing devices
IBM3 citations72
US10943580B2Mar 9, 2021
Phonological clustering
IBM0 citations63
US7470489B2Dec 30, 2008
Method for designing alternating phase shift masks
IBM4 citations63
US6927005B2Aug 9, 2005
Alternating phase shift mask design with optimized phase shapes
IBM3 citations63
US6824932B2Nov 30, 2004
Self-aligned alternating phase shift mask patterning process
IBM4 citations62
US12254393B2Mar 18, 2025
Risk assessment of a container build
IBM0 citations52
TOKYO ELECTRON LTD
7 patentsUS7829269B1Nov 9, 2010
Dual tone development with plural photo-acid generators in lithographic applications
TOKYO ELECTRON LTD32 citations92
US9786523B2Oct 10, 2017
Method and apparatus for substrate rinsing and drying
TOKYO ELECTRON LTD2 citations73
US9711419B2Jul 18, 2017
Substrate backside texturing
TOKYO ELECTRON LTD3 citations72
US9281251B2Mar 8, 2016
Substrate backside texturing
TOKYO ELECTRON LTD3 citations72
US11244873B2Feb 8, 2022
Systems and methods for manufacturing microelectronic devices
TOKYO ELECTRON LTD0 citations61
US11435393B2Sep 6, 2022
Enhancement of yield of functional microelectronic devices
TOKYO ELECTRON LTD0 citations60
US11346882B2May 31, 2022
Enhancement of yield of functional microelectronic devices
TOKYO ELECTRON LTD1 citations60
FONSECA CARLOS A
5 patentsUS8129080B2Mar 6, 2012
Variable resist protecting groups
FONSECA CARLOS A13 citations82
US8197996B2Jun 12, 2012
Dual tone development processes
FONSECA CARLOS A6 citations71
US8574810B2Nov 5, 2013
Dual tone development with a photo-activated acid enhancement component in lithographic applications
FONSECA CARLOS A2 citations61
US8283111B2Oct 9, 2012
Method for creating gray-scale features for dual tone development processes
FONSECA CARLOS A5 citations61
US8568964B2Oct 29, 2013
Flood exposure process for dual tone development in lithographic applications
FONSECA CARLOS A0 citations51