Inventor
KOJIMA Masafumi
JP19 patents
Patents
19 patentsUS10802399B2Oct 13, 2020
Actinic ray-sensitive or radiation-sensitive resin composition, resist film, pattern forming method, and method for manufacturing electronic device
FUJIFILM CORP5 citations72
US10018913B2Jul 10, 2018
Active-light-sensitive or radiation-sensitive resin composition, pattern forming method, and method for manufacturing electronic device
FUJIFILM CORP2 citations72
US9996003B2Jun 12, 2018
Active-light-sensitive or radiation-sensitive resin composition, pattern forming method, and method for manufacturing electronic device
FUJIFILM CORP4 citations72
US11067890B2Jul 20, 2021
Actinic ray-sensitive or radiation-sensitive resin composition, resist film, pattern forming method, and method for manufacturing electronic device
FUJIFILM CORP2 citations71
US10025186B2Jul 17, 2018
Active-light-sensitive or radiation-sensitive resin composition, pattern forming method, and method for manufacturing electronic device
FUJIFILM CORP2 citations71
US12032288B2Jul 9, 2024
Actinic ray-sensitive or radiation-sensitive resin composition, resist film, pattern forming method, and method for manufacturing electronic device
FUJIFILM CORP1 citations62
US10303058B2May 28, 2019
Pattern forming method, treating agent, electronic device, and method for manufacturing the same
FUJIFILM CORP1 citations61
US12007688B2Jun 11, 2024
Actinic ray-sensitive or radiation-sensitive resin composition, resist film, pattern forming method, method for manufacturing electronic device, and resin
FUJIFILM CORP0 citations58
US11886113B2Jan 30, 2024
Actinic ray-sensitive or radiation-sensitive resin composition, resist film, pattern forming method, and method for manufacturing electronic device
FUJIFILM CORP0 citations52
US9841679B2Dec 12, 2017
Actinic ray-sensitive or radiation-sensitive resin composition, pattern forming method, method for manufacturing electronic device, and electronic device
FUJIFILM CORP0 citations52
US12422752B2Sep 23, 2025
Actinic ray-sensitive or radiation-sensitive resin composition, resist film, pattern forming method, and method for manufacturing electronic device
FUJIFILM CORP0 citations51
US9791777B2Oct 17, 2017
Active light sensitive or radiation sensitive resin composition, pattern forming method, method for manufacturing electronic device, and electronic device
FUJIFILM CORP0 citations51
US12585187B2Mar 24, 2026
Actinic ray-sensitive or radiation-sensitive resin composition, resist film, pattern forming method, method for manufacturing electronic device, and compound
FUJIFILM CORP0 citations50
US12554196B2Feb 17, 2026
Actinic ray-sensitive or radiation-sensitive resin composition, pattern forming method, resist film, method for manufacturing electronic device, compound, and method for producing compound
FUJIFILM CORP0 citations50
US12216404B2Feb 4, 2025
Actinic ray-sensitive or radiation-sensitive resin composition, resist film, pattern forming method, and method for manufacturing electronic device
FUJIFILM CORP0 citations50
US12481215B2Nov 25, 2025
Active-light-sensitive or radiation-sensitive resin composition, resist film, pattern formation method, method for manufacturing electronic device, compound, and resin
FUJIFILM CORP0 citations49
US11073762B2Jul 27, 2021
Actinic ray-sensitive or radiation sensitive resin composition, actinic raysensitive or radiation-sensitive film, pattern forming method, method for manufacturing electronic device, and photoacid generator
FUJIFILM CORP0 citations48
US10234759B2Mar 19, 2019
Actinic-ray- or radiation-sensitive resin composition, actinic-ray- or radiation-sensitive film and method of forming pattern
FUJIFILM CORP0 citations41
US9952509B2Apr 24, 2018
Pattern forming method, actinic ray-sensitive or radiation-sensitive resin composition, method for manufacturing electronic device, and electronic device
FUJIFILM CORP0 citations40