Inventor
ECHIZEN HIROSHI
JP28 patents
⚠️ This page may combine multiple inventors who share the name “ECHIZEN HIROSHI”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
CANON KK
27 patentsUS6273955B1Aug 14, 2001
Film forming apparatus
CANON KK58 citations96
US5714010AFeb 3, 1998
Process for continuously forming a large area functional deposited film by a microwave PCVD method and an apparatus suitable for practicing the same
CANON KK80 citations96
US5527391AJun 18, 1996
Method and apparatus for continuously forming functional deposited films with a large area by a microwave plasma CVD method
CANON KK72 citations96
US5520740AMay 28, 1996
Process for continuously forming a large area functional deposited film by microwave PCVD method and apparatus suitable for practicing the same
CANON KK89 citations96
US5114770AMay 19, 1992
Method for continuously forming functional deposited films with a large area by a microwave plasma cvd method
CANON KK61 citations96
US6113732ASep 5, 2000
Deposited film forming apparatus
CANON KK37 citations93
US5510151AApr 23, 1996
Continuous film-forming process using microwave energy in a moving substrate web functioning as a substrate and plasma generating space
CANON KK42 citations93
US5171965ADec 15, 1992
Exposure method and apparatus
CANON KK51 citations93
US5130170AJul 14, 1992
Microwave pcvd method for continuously forming a large area functional deposited film using a curved moving substrate web with microwave energy with a directivity in one direction perpendicular to the direction of microwave propagation
CANON KK41 citations93
US6350489B1Feb 26, 2002
Deposited-film forming process and deposited-film forming apparatus
CANON KK46 citations92
US6338872B1Jan 15, 2002
Film forming method
CANON KK29 citations92
US4799791AJan 24, 1989
Illuminance distribution measuring system
CANON KK30 citations91
US7641382B2Jan 5, 2010
Leak judgment method, and computer-readable recording medium with recorded leak-judgment-executable program
CANON KK8 citations84
US5069928ADec 3, 1991
Microwave chemical vapor deposition apparatus and feedback control method
CANON KK17 citations82
US6783640B2Aug 31, 2004
Sputtering method and sputtering apparatus
CANON KK8 citations74
US6253703B1Jul 3, 2001
Microwave chemical vapor deposition apparatus
CANON KK9 citations74
US5010276AApr 23, 1991
Microwave plasma CVD apparatus with plasma generating chamber constituting a cylindrical cavity resonator
CANON KK17 citations74
US4806773AFeb 21, 1989
Wafer position detecting method and apparatus
CANON KK14 citations74
US4626449ADec 2, 1986
Method for forming deposition film
CANON KK11 citations74
US6930025B2Aug 16, 2005
Transparent conductive film formation process, photovoltaic device production process, transparent conductive film, and photovoltaic device
CANON KK10 citations73
US4717242AJan 5, 1988
Illumination optical system
CANON KK17 citations73
US7288140B2Oct 30, 2007
Wet process gas treatment apparatus
CANON KK2 citations63
US6860974B2Mar 1, 2005
Long-Term sputtering method
CANON KK4 citations63
US6821317B2Nov 23, 2004
Wet-process gas treatment method and wet-process gas treatment apparatus
CANON KK3 citations63
US5700326ADec 23, 1997
Microwave plasma processing apparatus
CANON KK4 citations61
US6740210B2May 25, 2004
Sputtering method for forming film and apparatus therefor
CANON KK1 citations52
US9312289B2Apr 12, 2016
Photoelectric conversion apparatus, manufacturing method thereof, and image pickup system
CANON KK0 citations42