Inventor

KUO CHING-SEN

TW35 patents

⚠️ This page may combine multiple inventors who share the name “KUO CHING-SEN”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

KUO CHING-SEN

TAIWAN SEMICONDUCTOR MFG CO LTD

Method of high-aspect ratio pattern formation with submicron pixel pitch

Method of using a surfactant-containing shrinkage material to prevent photoresist pattern collapse caused by capillary forces

Method for manufacturing semiconductor device

Semiconductor device and methods of manufacturing thereof

Method of using a surfactant-containing shrinkage material to prevent photoresist pattern collapse caused by capillary forces

Method of high-aspect ratio pattern formation with submicron pixel pitch

Patterning for substrate fabrication

Method of planarizating film

Method for reducing charging of semiconductor wafers

Image sensor device and manufacturing method thereof

Image sensor device and manufacturing method thereof

Method of using a surfactant-containing shrinkage material to prevent photoresist pattern collapse caused by capillary forces

Method for manufacturing semiconductor device

Semiconductor device and methods of manufacturing thereof

Techniques for forming a deep trench isolation structure between photodiodes by forming a first set of trenches based on a first pattern and forming a second set of trenches based on a second pattern

Method for reducing charging of semiconductor wafers

Implantation mask formation

Improving surface topography by forming spacer-like components

Implantation mask formation

Surface topography by forming spacer-like components

Method for manufacturing a semiconductor device

Image sensor device and manufacturing method thereof

Surface topography by forming spacer-like components

Integrated circuit structure with guard ring

Image device and methods of forming the same

TAIWAN SEMICONDUCTOR MFG

Method of forming planarized coatings on contact hole patterns of various duty ratios

Method to preserve alignment mark optical integrity

Enhance the process window of memory cell line/space dense pattern in sub-wavelength process

Methods to improve photonic performances of photo-sensitive integrated circuits

Method of forming planarized coatings on contact hole patterns of various duty ratios

Self-aligned patterning for deep implantation in a semiconductor structure

Poly-etching method for split gate flash memory cell

TIAWAN SEMICONDUCTOR MFG CO LT

Lens structures suitable for use in image sensors and method for making the same

LU WEN-CHEN

Image device and methods of forming the same

FU SHIH-CHI

Seamless multi-poly structure and methods of making same