Inventor
QIAN XUE-YU
US24 patents
⚠️ This page may combine multiple inventors who share the name “QIAN XUE-YU”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
APPLIED MATERIALS INC
22 patentsUS6712927B1Mar 30, 2004
Chamber having process monitoring window
APPLIED MATERIALS INC119 citations99
US6390019B1May 21, 2002
Chamber having improved process monitoring window
APPLIED MATERIALS INC186 citations99
US6016131AJan 18, 2000
Inductively coupled plasma reactor with an inductive coil antenna having independent loops
APPLIED MATERIALS INC137 citations99
US5907221AMay 25, 1999
Inductively coupled plasma reactor with an inductive coil antenna having independent loops
APPLIED MATERIALS INC150 citations99
US6699399B1Mar 2, 2004
Self-cleaning etch process
APPLIED MATERIALS INC500 citations98
US6136211AOct 24, 2000
Self-cleaning etch process
APPLIED MATERIALS INC160 citations98
US6447636B1Sep 10, 2002
Plasma reactor with dynamic RF inductive and capacitive coupling control
APPLIED MATERIALS INC215 citations97
US6379575B1Apr 30, 2002
Treatment of etching chambers using activated cleaning gas
APPLIED MATERIALS INC375 citations97
US5919382AJul 6, 1999
Automatic frequency tuning of an RF power source of an inductively coupled plasma reactor
APPLIED MATERIALS INC99 citations97
US6113731ASep 5, 2000
Magnetically-enhanced plasma chamber with non-uniform magnetic field
APPLIED MATERIALS INC152 citations96
US5534108AJul 9, 1996
Method and apparatus for altering magnetic coil current to produce etch uniformity in a magnetic field-enhanced plasma reactor
APPLIED MATERIALS INC52 citations96
US6100536AAug 8, 2000
Electron flood apparatus for neutralizing charge build-up on a substrate during ion implantation
APPLIED MATERIALS INC51 citations92
US5801386ASep 1, 1998
Apparatus for measuring plasma characteristics within a semiconductor wafer processing system and a method of fabricating and using same
APPLIED MATERIALS INC36 citations92
US5683539ANov 4, 1997
Inductively coupled RF plasma reactor with floating coil antenna for reduced capacitive coupling
APPLIED MATERIALS INC29 citations92
US5667701ASep 16, 1997
Method of measuring the amount of capacitive coupling of RF power in an inductively coupled plasma
APPLIED MATERIALS INC22 citations92
US5705433AJan 6, 1998
Etching silicon-containing materials by use of silicon-containing compounds
APPLIED MATERIALS INC19 citations88
US6504126B2Jan 7, 2003
Plasma reactor with coil antenna of concentrically spiral conductors with ends in common regions
APPLIED MATERIALS INC5 citations74
US6369348B2Apr 9, 2002
Plasma reactor with coil antenna of plural helical conductors with equally spaced ends
APPLIED MATERIALS INC5 citations74
US6297468B1Oct 2, 2001
Inductively coupled plasma reactor with symmetrical parallel multiple coils having a common RF terminal
APPLIED MATERIALS INC13 citations74
US5863839AJan 26, 1999
Silicon and polycide plasma etch appplications by use of silicon-containing compounds
APPLIED MATERIALS INC12 citations69
US6373022B2Apr 16, 2002
Plasma reactor with antenna of coil conductors of concentric helices offset along the axis of symmetry
APPLIED MATERIALS INC3 citations63
US6369349B2Apr 9, 2002
Plasma reactor with coil antenna of interleaved conductors
APPLIED MATERIALS INC3 citations63