Inventor
SATO ARTHUR H
US27 patents
⚠️ This page may combine multiple inventors who share the name “SATO ARTHUR H”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
APPLIED MATERIALS INC
13 patentsUS6016131AJan 18, 2000
Inductively coupled plasma reactor with an inductive coil antenna having independent loops
APPLIED MATERIALS INC137 citations99
US5907221AMay 25, 1999
Inductively coupled plasma reactor with an inductive coil antenna having independent loops
APPLIED MATERIALS INC150 citations99
US6472822B1Oct 29, 2002
Pulsed RF power delivery for plasma processing
APPLIED MATERIALS INC178 citations97
US6447636B1Sep 10, 2002
Plasma reactor with dynamic RF inductive and capacitive coupling control
APPLIED MATERIALS INC215 citations97
US5801386ASep 1, 1998
Apparatus for measuring plasma characteristics within a semiconductor wafer processing system and a method of fabricating and using same
APPLIED MATERIALS INC36 citations92
US5683539ANov 4, 1997
Inductively coupled RF plasma reactor with floating coil antenna for reduced capacitive coupling
APPLIED MATERIALS INC29 citations92
US6401652B1Jun 11, 2002
Plasma reactor inductive coil antenna with flat surface facing the plasma
APPLIED MATERIALS INC42 citations89
US5565074AOct 15, 1996
Plasma reactor with a segmented balanced electrode for sputtering process materials from a target surface
APPLIED MATERIALS INC30 citations86
US6504126B2Jan 7, 2003
Plasma reactor with coil antenna of concentrically spiral conductors with ends in common regions
APPLIED MATERIALS INC5 citations74
US6369348B2Apr 9, 2002
Plasma reactor with coil antenna of plural helical conductors with equally spaced ends
APPLIED MATERIALS INC5 citations74
US6297468B1Oct 2, 2001
Inductively coupled plasma reactor with symmetrical parallel multiple coils having a common RF terminal
APPLIED MATERIALS INC13 citations74
US6373022B2Apr 16, 2002
Plasma reactor with antenna of coil conductors of concentric helices offset along the axis of symmetry
APPLIED MATERIALS INC3 citations63
US6369349B2Apr 9, 2002
Plasma reactor with coil antenna of interleaved conductors
APPLIED MATERIALS INC3 citations63
LAM RES CORP
9 patentsUS10297422B2May 21, 2019
Systems and methods for calibrating conversion models and performing position conversions of variable capacitors in match networks of plasma processing systems
LAM RES CORP7 citations84
US10347464B2Jul 9, 2019
Cycle-averaged frequency tuning for low power voltage mode operation
LAM RES CORP2 citations73
US10332725B2Jun 25, 2019
Systems and methods for reversing RF current polarity at one output of a multiple output RF matching network
LAM RES CORP5 citations73
US10879044B2Dec 29, 2020
Auxiliary circuit in RF matching network for frequency tuning assisted dual-level pulsing
LAM RES CORP2 citations72
US7973539B1Jul 5, 2011
Methods for measuring dielectric properties of parts
LAM RES CORP3 citations62
US7777500B2Aug 17, 2010
Methods for characterizing dielectric properties of parts
LAM RES CORP2 citations62
US10431426B2Oct 1, 2019
Gas plenum arrangement for improving etch non-uniformity in transformer-coupled plasma systems
LAM RES CORP0 citations51
US9322795B2Apr 26, 2016
Electrode for use in measuring dielectric properties of parts
LAM RES CORP0 citations51
US7911213B2Mar 22, 2011
Methods for measuring dielectric properties of parts
LAM RES CORP0 citations51