Inventor
KUMAZAWA MASATO
JP13 patents
⚠️ This page may combine multiple inventors who share the name “KUMAZAWA MASATO”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
NIKON CORP
10 patentsUS6795169B2Sep 21, 2004
Exposure apparatus, optical projection apparatus and a method for adjusting the optical projection apparatus
NIKON CORP481 citations99
US5729331AMar 17, 1998
Exposure apparatus, optical projection apparatus and a method for adjusting the optical projection apparatus
NIKON CORP134 citations99
US6556278B1Apr 29, 2003
Exposure/imaging apparatus and method in which imaging characteristics of a projection optical system are adjusted
NIKON CORP26 citations96
US6351305B1Feb 26, 2002
Exposure apparatus and exposure method for transferring pattern onto a substrate
NIKON CORP26 citations95
US6509954B1Jan 21, 2003
Aperture stop having central aperture region defined by a circular ARC and peripheral region with decreased width, and exposure apparatus and method
NIKON CORP13 citations92
US6157497ADec 5, 2000
Exposure apparatus
NIKON CORP30 citations92
US7372544B2May 13, 2008
Exposure apparatus, optical projection apparatus and a method for adjusting the optical projection apparatus
NIKON CORP8 citations82
US7372543B2May 13, 2008
Exposure apparatus, optical projection apparatus and a method for adjusting the optical projection apparatus
NIKON CORP7 citations74
US7023527B2Apr 4, 2006
Exposure apparatus, optical projection apparatus and a method for adjusting the optical projection apparatus
NIKON CORP7 citations74
US8867019B2Oct 21, 2014
Projection optical system, exposure apparatus, exposure method, display manufacturing method, mask, and mask manufacturing method
NIKON CORP0 citations51
KUMAZAWA MASATO
2 patentsUS8305556B2Nov 6, 2012
Projection optical system, exposure apparatus, exposure method, display manufacturing method, mask, and mask manufacturing method
KUMAZAWA MASATO0 citations46
US8130364B2Mar 6, 2012
Projection optical apparatus, exposure method and apparatus, photomask, and device and photomask manufacturing method
KUMAZAWA MASATO0 citations33