Inventor

LIN CHIA-HUI

TW69 patents

⚠️ This page may combine multiple inventors who share the name “LIN CHIA-HUI”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

LIN CHIA-HUI

TAIWAN SEMICONDUCTOR MFG

Method for multiple spacer width control

Mask containing subresolution line to minimize proximity effect of contact hole

Pattern compensation for stitching

Method of forming DRAM capacitors with protected outside crown surface for more robust structures

Approach to increase the resolution of dense line/space patterns for 0.18 micron and below design rules using attenuating phase shifting masks

Method for proximity effect compensation on alternative phase-shift masks with bias and optical proximity correction

Mask and method of forming a mask for avoiding side lobe problems in forming contact holes

Application of e-beam proximity over-correction to compensate optical proximity effect in optical lithography process

Interlayer method utilizing CAD for process-induced proximity effect correction

Optical proximity correction during wafer processing through subfile bias modification with subsequent subfile merging

Selective spacer layer deposition method for forming spacers with different widths

Variable transmittance phase shifter to compensate for side lobe problem on rim type attenuating phase shifting masks

Process to fabricate a double layer attenuated phase shift mask (APSM) with chrome border

Mask and simplified method of forming a mask integrating attenuating phase shifting mask patterns and binary mask patterns on the same mask substrate

High aspect ratio gap fill application using high density plasma chemical vapor deposition

Method for forming a semiconductor device having high-K gate dielectric material

E-beam direct writing to pattern step profiles of dielectric layers applied to fill poly via with poly line, contact with metal line, and metal via with metal line

Surface treatment of metal interconnect lines

Surface treated low-k dielectric as diffusion barrier for copper metallization

Method to overcome image distortion of lines and contact holes in optical lithography

Simplified process for making an outrigger type phase shift mask

Method for creating the sub-resolution phase shifting pattern for outrigger type phase shifting masks

TAIWAN SEMICONDUCTOR MFG CO LTD

Forming doped regions in semiconductor strips

Semiconductor structure

Semiconductor device and method of manufacture

Semiconductor structure with barrier layer and method for forming the same

Forming doped regions in semiconductor strips

Semiconductor device and method

Semiconductor Fin cutting process and structures formed thereby

Semiconductor device and method

Semiconductor device and method of manufacture

Photonic assembly for enhanced bonding yield and methods for forming the same

Semiconductor structure with barrier layer and method for forming the same

INNOLUX CORP

Electronic device

Electronic device

Electronic device

Electronic device

Electronic device

Electronic device

SYSGRATION LTD

Computer mouse

Computer mouse structure

Touch-control computer house

Optical-reflecting decoder modular design mechanism of mouse

Photoelectric sensor for an X-Y position device

QUALCOMM INC

Unicast and broadcast protocol for wireless local area network ranging and direction finding

Unicast and broadcast protocol for wireless local area network ranging and direction finding

TAI YU ENTERPRISE CO LTD

Pivotal positioning means for use in beach umbrella

SHAOXING PUSHKANG BIOTECHNOLOGY CO LTD

Microfluidic device and method for operating thereof

IND TECH RES INST

Blockchain system and method thereof

3M INNOVATIVE PROPERTIES CO

Thermoplastic polyurethane compositions, articles, and methods thereof