Inventor

PIERRAT CHRISTOPHE

US180 patents

⚠️ This page may combine multiple inventors who share the name “PIERRAT CHRISTOPHE”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

PIERRAT CHRISTOPHE

NUMERICAL TECH INC

Design and layout of phase shifting photolithographic masks

Mask product made by selection of evaluation point locations based on proximity effects model amplitudes for correcting proximity effects in a fabricat layout

Displacing edge segments on a fabrication layout based on proximity effects model amplitudes for correcting proximity effects

Selection of evaluation point locations based on proximity effects model amplitudes for correcting proximity effects in a fabrication layout

Accelerated layout processing using OPC pre-processing

Dissection of edges with projection points in a fabrication layout for correcting proximity effects

Facilitating minimum spacing and/or width control optical proximity correction

Method and apparatus for facilitating process-compliant layout optimization

Dissection of printed edges from a fabrication layout for correcting proximity effects

Dissection of corners in a fabrication layout for correcting proximity effects

Method and apparatus for mixed-mode optical proximity correction

Method and apparatus for analyzing a layout using an instance-based representation

Phase shift masking for complex patterns with proximity adjustments

Optical proximity correction for phase shifting photolithographic masks

Method for high yield reticle formation

Phase shift mask sub-resolution assist features

Alternating phase shift mask design conflict resolution

Method and apparatus for exposing a wafer using multiple masks during an integrated circuit manufacturing process

MICRON TECHNOLOGY INC

Electrically programmable photolithography mask

Method for reducing photolithographic steps in a semiconductor interconnect process

Inspection method and apparatus for detecting defects on photomasks

Inspection technique of photomask

Inspection technique of photomask

Process for detecting defects in photomasks through aerial image comparisons

Methods of reducing proximity effects in lithographic processes

Method for multiple process parameter matching

Subresolution grating for attenuated phase shifting mask fabrication

Multiple image reticle for forming layers

Multiple image reticle for forming layers

Phase shift structure and method of fabrication

Method for fabricating and using defect-free phase shifting masks

Process for modifying a hierarchical mask layout

Process for designing and checking a mask layout

SYNOPSYS INC

Phase shift masking for complex patterns with proximity adjustments

High yield reticle with proximity effect halos

Dissection of printed edges from a fabrication layout for correcting proximity effects

Design and layout of phase shifting photolithographic masks

Critical dimension control using full phase and trim masks

Standard cell design incorporating phase information

Design data format and hierarchy management for phase processing

Model-based data conversion

Displacing edge segments on a fabrication layout based on proximity effects model amplitudes for correcting proximity effects

System and method for indentifying dummy features on a mask layer

Dissection of edges with projection points in a fabrication layout for correcting proximity effects

Method and system for simulating resist and etch edges

Full phase shifting mask in damascene process

MAGMA DESIGN AUTOMATION INC

Design-manufacturing interface via a unified model

AT & T BELL LAB

Single-alignment-level lithographic technique for achieving self-aligned features

CADENCE DESIGN SYSTEMS INC

Uniformity for semiconductor patterning operations

TAKUMI TECHNOLOGY CORP

Effective proximity effect correction methodology