Inventor
ONGAYI OWENDI
US25 patents
⚠️ This page may combine multiple inventors who share the name “ONGAYI OWENDI”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
ROHM & HAAS ELECT MAT
11 patentsUS9442377B1Sep 13, 2016
Wet-strippable silicon-containing antireflectant
ROHM & HAAS ELECT MAT19 citations92
US10031420B2Jul 24, 2018
Wet-strippable silicon-containing antireflectant
ROHM & HAAS ELECT MAT13 citations83
US9581901B2Feb 28, 2017
Photoacid-generating copolymer and associated photoresist composition, coated substrate, and method of forming an electronic device
ROHM & HAAS ELECT MAT2 citations73
US10114288B2Oct 30, 2018
Silicon-containing underlayers
ROHM & HAAS ELECT MAT3 citations71
US9182669B2Nov 10, 2015
Copolymer with acid-labile group, photoresist composition, coated substrate, and method of forming an electronic device
ROHM & HAAS ELECT MAT2 citations63
US10754249B2Aug 25, 2020
Coating compositions for photolithography
ROHM & HAAS ELECT MAT0 citations52
US10481494B1Nov 19, 2019
Coating compositions for use with an overcoated photoresist
ROHM & HAAS ELECT MAT0 citations52
US9690199B2Jun 27, 2017
Coating compositions for photolithography
ROHM & HAAS ELECT MAT0 citations52
US9206276B2Dec 8, 2015
Photosensitive copolymer, photoresist comprising the copolymer, and method of forming an electronic device
ROHM & HAAS ELECT MAT1 citations52
US10007184B2Jun 26, 2018
Silicon-containing underlayers
ROHM & HAAS ELECT MAT1 citations51
US9229319B2Jan 5, 2016
Photoacid-generating copolymer and associated photoresist composition, coated substrate, and method of forming an electronic device
ROHM & HAAS ELECT MAT0 citations42
ZAMPINI ANTHONY
4 patentsUS9323154B2Apr 26, 2016
Coating compositions for photolithography
ZAMPINI ANTHONY1 citations62
US8501383B2Aug 6, 2013
Coating compositions for use with an overcoated photoresist
ZAMPINI ANTHONY4 citations62
US9244352B2Jan 26, 2016
Coating compositions for use with an overcoated photoresist
ZAMPINI ANTHONY2 citations61
US8455178B2Jun 4, 2013
Coating compositions for photolithography
ZAMPINI ANTHONY0 citations51
DOW GLOBAL TECHNOLOGIES LLC
4 patentsUS9459533B2Oct 4, 2016
Polymer composition, photoresist comprising the polymer composition, and coated article comprising the photoresist
DOW GLOBAL TECHNOLOGIES LLC2 citations59
US12139595B2Nov 12, 2024
Low coefficient of friction ethylene-based compositions
DOW GLOBAL TECHNOLOGIES LLC0 citations58
US11879056B2Jan 23, 2024
Low coefficient of friction ethylene-based compositions
DOW GLOBAL TECHNOLOGIES LLC0 citations58
US12098313B2Sep 24, 2024
Low coefficient of friction laminates
DOW GLOBAL TECHNOLOGIES LLC0 citations44