P

Inventor

TANAKA TSUTOMU

JP344 patents
⚠️ This page may combine multiple inventors who share the name “TANAKA TSUTOMU”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

APPLIED MATERIALS INC

21 patents
US7695590B2Apr 13, 2010

Chemical vapor deposition plasma reactor having plural ion shower grids

APPLIED MATERIALS INC195 citations99
US7291360B2Nov 6, 2007

Chemical vapor deposition plasma process using plural ion shower grids

APPLIED MATERIALS INC186 citations99
US7244474B2Jul 17, 2007

Chemical vapor deposition plasma process using an ion shower grid

APPLIED MATERIALS INC195 citations99
US6039834AMar 21, 2000

Apparatus and methods for upgraded substrate processing system with microwave plasma source

APPLIED MATERIALS INC242 citations99
US5844195ADec 1, 1998

Remote plasma source

APPLIED MATERIALS INC388 citations99
US7767561B2Aug 3, 2010

Plasma immersion ion implantation reactor having an ion shower grid

APPLIED MATERIALS INC68 citations98
US6863019B2Mar 8, 2005

Semiconductor device fabrication chamber cleaning method and apparatus with recirculation of cleaning gas

APPLIED MATERIALS INC608 citations98
US6755150B2Jun 29, 2004

Multi-core transformer plasma source

APPLIED MATERIALS INC79 citations98
US6551446B1Apr 22, 2003

Externally excited torroidal plasma source with a gas distribution plate

APPLIED MATERIALS INC96 citations98
US6447651B1Sep 10, 2002

High-permeability magnetic shield for improved process uniformity in nonmagnetized plasma process chambers

APPLIED MATERIALS INC501 citations98
US6410449B1Jun 25, 2002

Method of processing a workpiece using an externally excited torroidal plasma source

APPLIED MATERIALS INC88 citations98
US6348126B1Feb 19, 2002

Externally excited torroidal plasma source

APPLIED MATERIALS INC121 citations98
US6045618AApr 4, 2000

Microwave apparatus for in-situ vacuum line cleaning for substrate processing equipment

APPLIED MATERIALS INC130 citations98
US6239553B1May 29, 2001

RF plasma source for material processing

APPLIED MATERIALS INC119 citations97
US6079426AJun 27, 2000

Method and apparatus for determining the endpoint in a plasma cleaning process

APPLIED MATERIALS INC132 citations97
US6494986B1Dec 17, 2002

Externally excited multiple torroidal plasma source

APPLIED MATERIALS INC65 citations96
US6468388B1Oct 22, 2002

Reactor chamber for an externally excited torroidal plasma source with a gas distribution plate

APPLIED MATERIALS INC66 citations96
US6453842B1Sep 24, 2002

Externally excited torroidal plasma source using a gas distribution plate

APPLIED MATERIALS INC62 citations96
US6361707B1Mar 26, 2002

Apparatus and methods for upgraded substrate processing system with microwave plasma source

APPLIED MATERIALS INC39 citations96
US6230652B1May 15, 2001

Apparatus and methods for upgraded substrate processing system with microwave plasma source

APPLIED MATERIALS INC43 citations96
US6329297B1Dec 11, 2001

Dilute remote plasma clean

APPLIED MATERIALS INC733 citations95

SUMITOMO WIRING SYSTEMS

12 patents

TOSHIBA KK

5 patents

MATSUSHITA ELECTRIC INDUSTRIAL CO LTD

5 patents

NIFCO INC

2 patents

SONY CORP

2 patents

MATSUSHITA ELECTRIC CO LTD

1 patent

KUDELA JOZEF

1 patent

SEIKO INSTR INC

1 patent

Showing the top 50 of 344 patents by PatentIndex Score.