Inventor
DAMMEL RALPH R
US44 patents
⚠️ This page may combine multiple inventors who share the name “DAMMEL RALPH R”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
CLARIANT FINANCE BVI LTD
18 patentsUS6447980B1Sep 10, 2002
Photoresist composition for deep UV and process thereof
CLARIANT FINANCE BVI LTD144 citations99
US6723488B2Apr 20, 2004
Photoresist composition for deep UV radiation containing an additive
CLARIANT FINANCE BVI LTD99 citations98
US6844131B2Jan 18, 2005
Positive-working photoimageable bottom antireflective coating
CLARIANT FINANCE BVI LTD113 citations97
US6274295B1Aug 14, 2001
Light-absorbing antireflective layers with improved performance due to refractive index optimization
CLARIANT FINANCE BVI LTD64 citations96
US6114085ASep 5, 2000
Antireflective composition for a deep ultraviolet photoresist
CLARIANT FINANCE BVI LTD112 citations96
US5981145ANov 9, 1999
Light absorbing polymers
CLARIANT FINANCE BVI LTD59 citations96
US5733714AMar 31, 1998
Antireflective coating for photoresist compositions
CLARIANT FINANCE BVI LTD78 citations95
US6365322B1Apr 2, 2002
Photoresist composition for deep UV radiation
CLARIANT FINANCE BVI LTD34 citations93
US6737215B2May 18, 2004
Photoresist composition for deep ultraviolet lithography
CLARIANT FINANCE BVI LTD33 citations92
US6686429B2Feb 3, 2004
Polymer suitable for photoresist compositions
CLARIANT FINANCE BVI LTD28 citations92
US6576394B1Jun 10, 2003
Negative-acting chemically amplified photoresist composition
CLARIANT FINANCE BVI LTD32 citations92
US5994430ANov 30, 1999
Antireflective coating compositions for photoresist compositions and use thereof
CLARIANT FINANCE BVI LTD42 citations92
US5922503AJul 13, 1999
Process for obtaining a lift-off imaging profile
CLARIANT FINANCE BVI LTD30 citations89
US6800415B2Oct 5, 2004
Negative-acting aqueous photoresist composition
CLARIANT FINANCE BVI LTD12 citations74
US6800416B2Oct 5, 2004
Negative deep ultraviolet photoresist
CLARIANT FINANCE BVI LTD9 citations72
US6372414B1Apr 16, 2002
Lift-off process for patterning fine metal lines
CLARIANT FINANCE BVI LTD7 citations71
US6042992AMar 28, 2000
Bottom antireflective coatings through refractive index modification by anomalous dispersion
CLARIANT FINANCE BVI LTD15 citations67
US5719004AFeb 17, 1998
Positive photoresist composition containing a 2,4-dinitro-1-naphthol
CLARIANT FINANCE BVI LTD5 citations60
AZ ELECTRONIC MATERIALS USA
14 patentsUS6991888B2Jan 31, 2006
Photoresist composition for deep ultraviolet lithography comprising a mixture of photoactive compounds
AZ ELECTRONIC MATERIALS USA84 citations98
US7745077B2Jun 29, 2010
Composition for coating over a photoresist pattern
AZ ELECTRONIC MATERIALS USA31 citations92
US7595141B2Sep 29, 2009
Composition for coating over a photoresist pattern
AZ ELECTRONIC MATERIALS USA46 citations92
US7416834B2Aug 26, 2008
Antireflective coating compositions
AZ ELECTRONIC MATERIALS USA19 citations92
US7521170B2Apr 21, 2009
Photoactive compounds
AZ ELECTRONIC MATERIALS USA21 citations91
US7033728B2Apr 25, 2006
Photoresist composition
AZ ELECTRONIC MATERIALS USA18 citations84
US7816071B2Oct 19, 2010
Process of imaging a photoresist with multiple antireflective coatings
AZ ELECTRONIC MATERIALS USA19 citations83
US7473512B2Jan 6, 2009
Process of imaging a deep ultraviolet photoresist with a top coating and materials thereof
AZ ELECTRONIC MATERIALS USA18 citations83
US7923200B2Apr 12, 2011
Composition for coating over a photoresist pattern comprising a lactam
AZ ELECTRONIC MATERIALS USA17 citations82
US7537879B2May 26, 2009
Photoresist composition for deep UV and process thereof
AZ ELECTRONIC MATERIALS USA3 citations62
US7211366B2May 1, 2007
Photoresist composition for deep ultraviolet lithography
AZ ELECTRONIC MATERIALS USA5 citations62
US7833693B2Nov 16, 2010
Photoactive compounds
AZ ELECTRONIC MATERIALS USA1 citations51
US7547501B2Jun 16, 2009
Photoactive compounds
AZ ELECTRONIC MATERIALS USA1 citations48
US7351521B2Apr 1, 2008
Photoresist composition for deep ultraviolet lithography
AZ ELECTRONIC MATERIALS USA0 citations41
HOECHST CELANESE CORP
8 patentsUS5688893ANov 18, 1997
Method of using a Lewis base to control molecular weight of novolak resins
HOECHST CELANESE CORP18 citations92
US5652317AJul 29, 1997
Antireflective coatings for photoresist compositions
HOECHST CELANESE CORP28 citations92
US5652297AJul 29, 1997
Aqueous antireflective coatings for photoresist compositions
HOECHST CELANESE CORP38 citations92
US5476750ADec 19, 1995
Metal ion reduction in the raw materials and using a Lewis base to control molecular weight of novolak resin to be used in positive photoresists
HOECHST CELANESE CORP32 citations92
US5221592AJun 22, 1993
Diazo ester of a benzolactone ring compound and positive photoresist composition and element utilizing the diazo ester
HOECHST CELANESE CORP6 citations73
US5510420AApr 23, 1996
Matarix resin for high-temperature stable photoimageable compositions
HOECHST CELANESE CORP9 citations66
US5348842ASep 20, 1994
Method for producing positive photoresist image utilizing diazo ester of benzolactone ring compound and diazo sulfonyl chloride
HOECHST CELANESE CORP4 citations62
US5614349AMar 25, 1997
Using a Lewis base to control molecular weight of novolak resins
HOECHST CELANESE CORP1 citations52