Inventor
SAKAMURI RAJ
US21 patents
⚠️ This page may combine multiple inventors who share the name “SAKAMURI RAJ”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
FUJIFILM ELECTRONIC MAT USA INC
14 patentsUS11899364B2Feb 13, 2024
Photosensitive polyimide compositions
FUJIFILM ELECTRONIC MAT USA INC1 citations72
US10036952B2Jul 31, 2018
Photosensitive polyimide compositions
FUJIFILM ELECTRONIC MAT USA INC4 citations72
US10875965B2Dec 29, 2020
Dielectric film forming composition
FUJIFILM ELECTRONIC MAT USA INC2 citations71
US11782344B2Oct 10, 2023
Photosensitive polyimide compositions
FUJIFILM ELECTRONIC MAT USA INC0 citations62
US11208616B2Dec 28, 2021
Stripping compositions for removing photoresists from semiconductor substrates
FUJIFILM ELECTRONIC MAT USA INC0 citations62
US11175582B2Nov 16, 2021
Photosensitive stacked structure
FUJIFILM ELECTRONIC MAT USA INC0 citations62
US12338309B2Jun 24, 2025
Dielectric film-forming composition
FUJIFILM ELECTRONIC MAT USA INC0 citations61
US11945894B2Apr 2, 2024
Dielectric film-forming composition
FUJIFILM ELECTRONIC MAT USA INC0 citations61
US11721543B2Aug 8, 2023
Planarizing process and composition
FUJIFILM ELECTRONIC MAT USA INC0 citations57
US11939428B2Mar 26, 2024
Polyimides
FUJIFILM ELECTRONIC MAT USA INC0 citations51
US11061327B2Jul 13, 2021
Polyimides
FUJIFILM ELECTRONIC MAT USA INC0 citations51
US10696932B2Jun 30, 2020
Cleaning composition
FUJIFILM ELECTRONIC MAT USA INC0 citations51
US10345707B2Jul 9, 2019
Stripping process
FUJIFILM ELECTRONIC MAT USA INC0 citations50
US10793676B2Oct 6, 2020
Polyimides
FUJIFILM ELECTRONIC MAT USA INC0 citations41
AZ ELECTRONIC MATERIALS USA
4 patentsUS7473512B2Jan 6, 2009
Process of imaging a deep ultraviolet photoresist with a top coating and materials thereof
AZ ELECTRONIC MATERIALS USA18 citations83
US7070914B2Jul 4, 2006
Process for producing an image using a first minimum bottom antireflective coating composition
AZ ELECTRONIC MATERIALS USA18 citations83
US7211366B2May 1, 2007
Photoresist composition for deep ultraviolet lithography
AZ ELECTRONIC MATERIALS USA5 citations62
US7351521B2Apr 1, 2008
Photoresist composition for deep ultraviolet lithography
AZ ELECTRONIC MATERIALS USA0 citations41