Inventor
PREIL MOSHE E
US24 patents
⚠️ This page may combine multiple inventors who share the name “PREIL MOSHE E”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
PREIL MOSHE E
7 patentsUS8280146B2Oct 2, 2012
Photo-mask and wafer image reconstruction
PREIL MOSHE E13 citations91
US8260032B2Sep 4, 2012
Photo-mask and wafer image reconstruction
PREIL MOSHE E14 citations91
US8208712B2Jun 26, 2012
Photo-mask and wafer image reconstruction
PREIL MOSHE E24 citations91
US8204295B2Jun 19, 2012
Photo-mask and wafer image reconstruction
PREIL MOSHE E21 citations91
US8200002B2Jun 12, 2012
Photo-mask and wafer image reconstruction
PREIL MOSHE E22 citations91
US8644588B2Feb 4, 2014
Photo-mask and wafer image reconstruction
PREIL MOSHE E5 citations83
US8331645B2Dec 11, 2012
Photo-mask and wafer image reconstruction
PREIL MOSHE E15 citations83
GLOBALFOUNDRIES INC
4 patentsUS8790522B1Jul 29, 2014
Chemical and physical templates for forming patterns using directed self-assembly materials
GLOBALFOUNDRIES INC20 citations90
US8956808B2Feb 17, 2015
Asymmetric templates for forming non-periodic patterns using directed self-assembly materials
GLOBALFOUNDRIES INC11 citations82
US8889343B2Nov 18, 2014
Optimizing lithographic processes using laser annealing techniques
GLOBALFOUNDRIES INC6 citations72
US9508562B2Nov 29, 2016
Sidewall image templates for directed self-assembly materials
GLOBALFOUNDRIES INC2 citations62
KLA TENCOR TECH CORP
3 patentsUS7689966B2Mar 30, 2010
Methods, systems, and carrier media for evaluating reticle layout data
KLA TENCOR TECH CORP57 citations98
US7646906B2Jan 12, 2010
Computer-implemented methods for detecting defects in reticle design data
KLA TENCOR TECH CORP85 citations97
US7769225B2Aug 3, 2010
Methods and systems for detecting defects in a reticle design pattern
KLA TENCOR TECH CORP80 citations96
KLA TENCOR CORP
3 patentsUS6868301B1Mar 15, 2005
Method and application of metrology and process diagnostic information for improved overlay control
KLA TENCOR CORP16 citations84
US10474042B2Nov 12, 2019
Stochastically-aware metrology and fabrication
KLA TENCOR CORP7 citations82
US10777377B2Sep 15, 2020
Multi-column spacing for photomask and reticle inspection and wafer print check verification
KLA TENCOR CORP0 citations41
ASML NETHERLANDS BV
2 patentsUS7853920B2Dec 14, 2010
Method for detecting, sampling, analyzing, and correcting marginal patterns in integrated circuit manufacturing
ASML NETHERLANDS BV67 citations97
US7749666B2Jul 6, 2010
System and method for measuring and analyzing lithographic parameters and determining optimal process corrections
ASML NETHERLANDS BV44 citations92