Inventor
KATO YOSHIKAZU
JP46 patents
⚠️ This page may combine multiple inventors who share the name “KATO YOSHIKAZU”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
SONY CORP
7 patentsUS7054865B2May 30, 2006
Information retrieval apparatus
SONY CORP7 citations74
US7321868B2Jan 22, 2008
Information processing apparatus and method, information processing system and method, and program
SONY CORP4 citations63
US9742039B2Aug 22, 2017
Current collector, negative electrode and battery
SONY CORP1 citations62
US9584586B2Feb 28, 2017
Information processing apparatus, information processing method, storage medium, and program
SONY CORP0 citations52
US9640830B2May 2, 2017
Current collector, negative electrode and battery
SONY CORP0 citations51
US7951488B2May 31, 2011
Cathode and battery including same
SONY CORP0 citations51
US7691534B2Apr 6, 2010
Cathode and battery including same
SONY CORP0 citations51
EBARA CORP
6 patentsUS11088011B2Aug 10, 2021
Elastic membrane, substrate holding device, and polishing apparatus
EBARA CORP2 citations73
US12068189B2Aug 20, 2024
Elastic membrane, substrate holding device, and polishing apparatus
EBARA CORP0 citations62
USD918161SMay 4, 2021
Elastic membrane
EBARA CORP1 citations62
US11951588B2Apr 9, 2024
Optical film-thickness measuring apparatus and polishing apparatus
EBARA CORP0 citations52
US11745306B2Sep 5, 2023
Polishing apparatus and method of controlling inclination of stationary ring
EBARA CORP0 citations52
US11731235B2Aug 22, 2023
Polishing apparatus and polishing method
EBARA CORP0 citations52
FUJITSU LTD
5 patentsUS6809360B2Oct 26, 2004
Semiconductor device and method of manufacturing the same
FUJITSU LTD22 citations92
US4938839AJul 3, 1990
Method of removing photoresist on a semiconductor wafer
FUJITSU LTD50 citations92
US4744861AMay 17, 1988
Method of producing semiconductor device using reactive ion etching
FUJITSU LTD35 citations92
US6533948B2Mar 18, 2003
Method of manufacturing semiconductor device having ferro-dielectric material film
FUJITSU LTD14 citations83
US4789427ADec 6, 1988
Method for removing resist from semiconductor device
FUJITSU LTD19 citations78
KATO YOSHIKAZU
3 patentsUS9385373B2Jul 5, 2016
Battery having anode with active material layer comprising resin containing limited quantity of sulfur
KATO YOSHIKAZU0 citations49
US9254452B2Feb 9, 2016
Crystallization device
KATO YOSHIKAZU0 citations49
US8706512B2Apr 22, 2014
Information processing apparatus, information processing method, storage medium, and program
KATO YOSHIKAZU1 citations49
TOKAI RUBBER IND LTD
2 patentsYAMASA CORP
2 patentsMATSUSHITA ELECTRIC INDUSTRIAL CO LTD
2 patentsTOYOTA MOTOR CO LTD
2 patentsHONDA TSUSHIN KOGYO CO LTD
2 patentsPATIC TRUST CO LTD
2 patentsUS11675887B2Jun 13, 2023
Movement history information confirming method, system therefor, and management server
PATIC TRUST CO LTD0 citations49
US11494942B2Nov 8, 2022
Information processing device, information processing method, program, recording medium, and camera system
PATIC TRUST CO LTD0 citations49