Inventor

GRIMM VOLKER

DE12 patents

⚠️ This page may combine multiple inventors who share the name “GRIMM VOLKER”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

ADVANCED MICRO DEVICES INC

5 patents

US7550396B2Jun 23, 2009

Method for reducing resist poisoning during patterning of silicon nitride layers in a semiconductor device

ADVANCED MICRO DEVICES INC507 citations98

US6897114B2May 24, 2005

Methods of forming a transistor having a recessed gate electrode structure

ADVANCED MICRO DEVICES INC13 citations83

US6969676B2Nov 29, 2005

Method of adjusting etch selectivity by adapting aspect ratios in a multi-level etch process

ADVANCED MICRO DEVICES INC11 citations73

US7816273B2Oct 19, 2010

Technique for removing resist material after high dose implantation in a semiconductor device

ADVANCED MICRO DEVICES INC6 citations58

US7166530B2Jan 23, 2007

Method of forming contact pads

ADVANCED MICRO DEVICES INC0 citations40

GRIMM VOLKER

2 patents

US10489263B2Nov 26, 2019

Method for operating a container treatment system with fault diagnosis

GRIMM VOLKER9 citations79

US8869636B2Oct 28, 2014

Method and apparatus for checking gripping elements

GRIMM VOLKER0 citations47

CHUMAKOV DMYTRO

1 patent

US9070639B2Jun 30, 2015

Shrinkage of critical dimensions in a semiconductor device by selective growth of a mask material

CHUMAKOV DMYTRO0 citations50

FROHBERG KAI

1 patent

US9006114B2Apr 14, 2015

Method for selectively removing a spacer in a dual stress liner approach

FROHBERG KAI0 citations50

ZAHNRADFABRIK FRIEDRICHSHAFEN

1 patent

US12570152B2Mar 10, 2026

Method for controlling the operation of an electric machine of a motor vehicle

ZAHNRADFABRIK FRIEDRICHSHAFEN0 citations42

GLOBALFOUNDRIES INC

1 patent

US7763507B2Jul 27, 2010

Stressed interlayer dielectric with reduced probability for void generation in a semiconductor device by using an intermediate etch control layer of increased thickness

GLOBALFOUNDRIES INC0 citations41

NAUMANN RONALD

1 patent

US9318345B2Apr 19, 2016

Enhancing transistor performance by reducing exposure to oxygen plasma in a dual stress liner approach

NAUMANN RONALD0 citations26