Inventor
AHN BYUNG-HO
KR7 patents
⚠️ This page may combine multiple inventors who share the name “AHN BYUNG-HO”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
SAMSUNG ELECTRONICS CO LTD
6 patentsUS6828254B2Dec 7, 2004
Plasma enhanced chemical vapor deposition apparatus and method for forming nitride layer using the same
SAMSUNG ELECTRONICS CO LTD14 citations82
US9666459B2May 30, 2017
Apparatus for processing wafers
SAMSUNG ELECTRONICS CO LTD7 citations79
US10863091B2Dec 8, 2020
Method and apparatus for correcting influence of movements of electronic device on image
SAMSUNG ELECTRONICS CO LTD2 citations70
US10965871B2Mar 30, 2021
Apparatus and method for compensating for image change caused by optical image stabilization motion
SAMSUNG ELECTRONICS CO LTD3 citations69
US6815370B2Nov 9, 2004
Plasma enhanced chemical vapor deposition apparatus and method for forming nitride layer using the same
SAMSUNG ELECTRONICS CO LTD4 citations61
US11363199B2Jun 14, 2022
Apparatus and method for estimating optical image stabilization motion
SAMSUNG ELECTRONICS CO LTD1 citations59