Inventor
SHIN SEUNG MOK
KR15 patents
⚠️ This page may combine multiple inventors who share the name “SHIN SEUNG MOK”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
SAMSUNG ELECTRONICS CO LTD
9 patentsUS6251746B1Jun 26, 2001
Methods of forming trench isolation regions having stress-reducing nitride layers therein
SAMSUNG ELECTRONICS CO LTD66 citations94
US6730570B2May 4, 2004
Method for forming a self-aligned contact of a semiconductor device and method for manufacturing a semiconductor device using the same
SAMSUNG ELECTRONICS CO LTD33 citations92
US6828254B2Dec 7, 2004
Plasma enhanced chemical vapor deposition apparatus and method for forming nitride layer using the same
SAMSUNG ELECTRONICS CO LTD14 citations82
US6794263B1Sep 21, 2004
Method of manufacturing a semiconductor device including alignment mark
SAMSUNG ELECTRONICS CO LTD8 citations71
US7342286B2Mar 11, 2008
Electrical node of transistor and method of forming the same
SAMSUNG ELECTRONICS CO LTD2 citations62
US6881637B2Apr 19, 2005
Method of forming a gate electrode, method of manufacturing a semiconductor device having the gate electrode, and method of oxidizing a substrate
SAMSUNG ELECTRONICS CO LTD2 citations62
US7592227B2Sep 22, 2009
Methods of manufacturing a semiconductor device
SAMSUNG ELECTRONICS CO LTD2 citations61
US6815370B2Nov 9, 2004
Plasma enhanced chemical vapor deposition apparatus and method for forming nitride layer using the same
SAMSUNG ELECTRONICS CO LTD4 citations61
US7101803B2Sep 5, 2006
Method of trench isolation and method for manufacturing a non-volatile memory device using the same
SAMSUNG ELECTRONICS CO LTD1 citations52