Inventor

KORI DAISUKE

JP93 patents

⚠️ This page may combine multiple inventors who share the name “KORI DAISUKE”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

KORI DAISUKE

SHINETSU CHEMICAL CO

Compound for forming organic film, composition for forming organic film, method for forming organic film, and patterning process

Underlayer film-forming composition and pattern forming process

Underlayer film-forming composition and pattern forming process

Resist underlayer film composition, patterning process, and compound

Resist under layer film composition and patterning process

Compound for forming organic film, and organic film composition using the same, process for forming organic film, and patterning process

Composition for forming resist underlayer film and patterning process

Method for forming multi-layer film and patterning process

Method for forming a resist under layer film and patterning process

Resist underlayer film composition and patterning process using the same

Resist top coat composition and patterning process

Compound for forming organic film, composition for forming organic film, method for forming organic film, and patterning process

Resist underlayer film composition, patterning process, and method for forming resist underlayer film

Resist underlayer film composition, patterning process, and method for forming resist underlayer film

Organic film composition, process for forming organic film, patterning process, and compound

Method for producing semiconductor apparatus substrate

Material for forming organic film, patterning process, and compound

Method of cleaning and drying semiconductor substrate

Composition for forming organic film, patterning process, and resin for forming organic film

Method for cleaning and drying semiconductor substrate

Compound for forming organic film, and organic film composition using the same, process for forming organic film, and patterning process

Underlayer film-forming composition and pattern forming process

Resist underlayer film composition, method for producing polymer for resist underlayer film, and patterning process using the resist underlayer film composition

Naphthalene derivative, resist bottom layer material, and patterning process

Material for forming organic film, patterning process, and polymer

Resist underlayer film material, patterning process, and method for forming resist underlayer film

Composition for forming organic film, patterning process, and polymer

Material for forming organic film, substrate for manufacturing semiconductor apparatus, method for forming organic film, and patterning process

Material for forming organic film, substrate for manufacturing semiconductor device, method for forming organic film, patterning process, and compound for forming organic film

Composition for forming organic film, substrate for manufacturing semiconductor device, method for forming organic film, and patterning process

HITACHI LTD

Permanent magnet electrical rotating machine, wind power generating system, and a method of magnetizing a permanent magnet

Permanent-magnet type electric rotating machine and permanent-magnet type electric rotating machine system for automobile or train

Permanent magnet electrical rotating machine, wind power generating system, and a method of magnetizing a permanent magnet

Permanent magnet pump motor

Permanent magnet type rotary electric machine

Rotating electric machine having a cooling frame with a plurality of coolants

Rotating electric machine or wind power generation system

Permanent magnet rotating electric machine

OGIHARA TSUTOMU

Resist underlayer film composition and patterning process using the same

Resist underlayer film composition and patterning process using the same

Resist underlayer film composition and patterning process using the same

Resist underlayer film composition and patterning process using the same

KORI DAISUKE

Biphenyl derivative, resist bottom layer material, bottom layer forming method, and patterning process

Permanent magnetic rotating electric machine and wind power generating system

Permanent magnet type electric power generator

Permanent magnet type electrical rotating machine and permanent magnet type electrical rotating machine system for vehicle

KINSHO TAKESHI

Naphthalene derivative, resist bottom layer material, and patterning process

Naphthalene derivative, resist bottom layer material, resist bottom layer forming method, and patterning process

IWAJI YOSHITAKA

Rotator control device, rotator system, vehicle, electric car and electric generation system

WATANABE TAKERU

Resist underlayer film composition, process for forming resist underlayer film, patterning process and fullerene derivative