Inventor
WATANABE TAKERU
JP189 patents
⚠️ This page may combine multiple inventors who share the name “WATANABE TAKERU”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
SHINETSU CHEMICAL CO
39 patentsUS6448420B1Sep 10, 2002
Acid-decomposable ester compound suitable for use in resist material
SHINETSU CHEMICAL CO160 citations99
US6312867B1Nov 6, 2001
Ester compounds, polymers, resist compositions and patterning process
SHINETSU CHEMICAL CO209 citations99
US7569326B2Aug 4, 2009
Sulfonium salt having polymerizable anion, polymer, resist composition, and patterning process
SHINETSU CHEMICAL CO129 citations98
US7084303B2Aug 1, 2006
Tertiary amine compounds having an ester structure and processes for preparing same
SHINETSU CHEMICAL CO79 citations98
US7511169B2Mar 31, 2009
Sulfonate salts and derivatives, photoacid generators, resist compositions, and patterning process
SHINETSU CHEMICAL CO45 citations96
US6673511B1Jan 6, 2004
Resist composition
SHINETSU CHEMICAL CO48 citations96
US6517994B2Feb 11, 2003
Lactone ring-containing (meth)acrylate and polymer thereof for photoresist composition
SHINETSU CHEMICAL CO57 citations96
US6147249ANov 14, 2000
Ester compounds, polymers, resist composition and patterning process
SHINETSU CHEMICAL CO81 citations96
US7981589B2Jul 19, 2011
Fluorinated monomer, fluorinated polymer, resist composition and patterning process
SHINETSU CHEMICAL CO22 citations93
US7919226B2Apr 5, 2011
Sulfonate salts and derivatives, photoacid generators, resist compositions, and patterning process
SHINETSU CHEMICAL CO19 citations93
US7759047B2Jul 20, 2010
Resist protective film composition and patterning process
SHINETSU CHEMICAL CO33 citations93
US7670751B2Mar 2, 2010
Photoacid generator, resist composition, and patterning process
SHINETSU CHEMICAL CO26 citations93
US7622242B2Nov 24, 2009
Resist composition and patterning process
SHINETSU CHEMICAL CO25 citations93
US7569324B2Aug 4, 2009
Sulfonate salts and derivatives, photoacid generators, resist compositions, and patterning process
SHINETSU CHEMICAL CO18 citations93
US7527912B2May 5, 2009
Photoacid generators, resist compositions, and patterning process
SHINETSU CHEMICAL CO38 citations93
US7514202B2Apr 7, 2009
Thermal acid generator, resist undercoat material and patterning process
SHINETSU CHEMICAL CO37 citations93
US6916593B2Jul 12, 2005
Resist composition
SHINETSU CHEMICAL CO33 citations93
US6749988B2Jun 15, 2004
Amine compounds, resist compositions and patterning process
SHINETSU CHEMICAL CO43 citations93
US6746818B2Jun 8, 2004
(Meth)acrylates having lactone structure, polymers, photoresist compositions and patterning process
SHINETSU CHEMICAL CO48 citations93
US6743564B2Jun 1, 2004
Amine compounds, resist compositions and patterning process
SHINETSU CHEMICAL CO22 citations93
US6673515B2Jan 6, 2004
Polymer, resist composition and patterning process
SHINETSU CHEMICAL CO20 citations93
US6492090B2Dec 10, 2002
Polymers, resist compositions and patterning process
SHINETSU CHEMICAL CO25 citations93
US6444396B1Sep 3, 2002
Ester compounds, polymers, resist composition and patterning process
SHINETSU CHEMICAL CO24 citations93
US6284429B1Sep 4, 2001
Ester compounds, polymers, resist compositions and patterning process
SHINETSU CHEMICAL CO50 citations93
US10444628B2Oct 15, 2019
Compound for forming organic film, composition for forming organic film, method for forming organic film, and patterning process
SHINETSU CHEMICAL CO8 citations84
US9805943B2Oct 31, 2017
Polymer for resist under layer film composition, resist under layer film composition, and patterning process
SHINETSU CHEMICAL CO7 citations84
US9372404B2Jun 21, 2016
Organic film composition, method for forming organic film and patterning process using this, and heat-decomposable polymer
SHINETSU CHEMICAL CO8 citations84
US8349533B2Jan 8, 2013
Resist lower-layer composition containing thermal acid generator, resist lower layer film-formed substrate, and patterning process
SHINETSU CHEMICAL CO14 citations84
US7629108B2Dec 8, 2009
Nitrogen-containing organic compound, resist composition and patterning process
SHINETSU CHEMICAL CO16 citations84
US7556909B2Jul 7, 2009
Sulfonate salts and derivatives, photoacid generators, resist compositions, and patterning process
SHINETSU CHEMICAL CO9 citations84
US7531289B2May 12, 2009
Fluorinated monomer having cyclic structure, manufacturing method, polymer, photoresist composition and patterning process
SHINETSU CHEMICAL CO16 citations84
US7531290B2May 12, 2009
Sulfonate salts and derivatives, photoacid generators, resist compositions, and patterning process
SHINETSU CHEMICAL CO17 citations84
US7312288B2Dec 25, 2007
Polymerizable fluorinated ester compounds and their preparing processes
SHINETSU CHEMICAL CO12 citations84
US6794111B2Sep 21, 2004
Polymers, resist compositions and patterning process, novel tetrahydrofuran compounds and their preparation
SHINETSU CHEMICAL CO16 citations84
US6566038B2May 20, 2003
Polymers, resist compositions and patterning process
SHINETSU CHEMICAL CO13 citations84
US6524765B1Feb 25, 2003
Polymer, resist composition and patterning process
SHINETSU CHEMICAL CO14 citations84
US6509135B2Jan 21, 2003
Polymer, resist composition and patterning process
SHINETSU CHEMICAL CO16 citations84
US6413695B1Jul 2, 2002
Resist compositions and patterning process
SHINETSU CHEMICAL CO18 citations84
US6399274B1Jun 4, 2002
Resist composition and patterning process
SHINETSU CHEMICAL CO20 citations84
HATAKEYAMA JUN
3 patentsUS8921026B2Dec 30, 2014
Basic compound, chemically amplified resist composition, and patterning process
HATAKEYAMA JUN9 citations84
US8323872B2Dec 4, 2012
Resist protective coating material and patterning process
HATAKEYAMA JUN15 citations84
US8105760B2Jan 31, 2012
Patterning process and pattern surface coating composition
HATAKEYAMA JUN11 citations84
WATANABE SATOSHI
2 patentsOHSAWA YOUICHI
2 patentsOHASHI MASAKI
1 patentOGIHARA TSUTOMU
1 patentWATANABE TAKERU
1 patentEUDYNA DEVICES INC
1 patentShowing the top 50 of 189 patents by PatentIndex Score.