P

Inventor

SCHELER SIEGFRIED

DE17 patents
⚠️ This page may combine multiple inventors who share the name “SCHELER SIEGFRIED”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

HOECHST AG

16 patents
US4540648ASep 10, 1985

Two-component diazotype material with ultraviolet light-absorbing dye salt of a benzothiazole

HOECHST AG43 citations92
US4492749AJan 8, 1985

Diazotype materials with 2-hydroxy-naphthalene having sulfonamide substituent as coupler

HOECHST AG20 citations81
US5114816AMay 19, 1992

Radiation-sensitive compounds, radiation-sensitive mixture prepared therewith and copying material

HOECHST AG9 citations73
US4334004AJun 8, 1982

Light-sensitive diazotype material with 2-hydroxy-3-naphthoic acid amides having 6-sulfonic acid amide substitution

HOECHST AG8 citations73
US5413899AMay 9, 1995

Light-sensitive mixture containing an 0-naphthoquinonediazide-sulfonic acid ester and recording material produced therewith wherein the 0-naphthoquinone diazides are partial esters

HOECHST AG2 citations63
US5563018AOct 8, 1996

(1,2-naphthoquinone 2-diazide) sulfonic acid esters, radiation-sensitive mixture prepared therewith and radiation-sensitive recording material

HOECHST AG2 citations62
US5306595AApr 26, 1994

Composition containing naphthoquinone diazide sulfonic acid mixed esters and radiation-sensitive recording material prepared therewith

HOECHST AG3 citations62
US4590143AMay 20, 1986

Two-component diazotype material with diazonium salt with anion of benzene or toluene sulfonate

HOECHST AG2 citations62
US4321373AMar 23, 1982

2-Hydroxy-3-naphthoic acid amides

HOECHST AG2 citations62
US5082932AJan 21, 1992

Process for preparing substituted 1,2-naphthoquinone-(2)-diazide-4-sulfonic acid esters and their use in a radiation-sensitive mixture

HOECHST AG6 citations61
US4457997AJul 3, 1984

Two-component diazotype material

HOECHST AG3 citations61
US4317875AMar 2, 1982

Recording material containing diazo compounds and process for the manufacture thereof

HOECHST AG3 citations61
US5192640AMar 9, 1993

Process for preparing 7-hydroxy-1,2-naphthoquinone-2-diazide-4-sulfonic acid or salts thereof

HOECHST AG1 citations52
US5077395ADec 31, 1991

Substituted 1,2-naphthoquinone-2-diazide-4-sulfonic acids and processes for their preparation and use

HOECHST AG1 citations52
US5268252ADec 7, 1993

Radiation-sensitive ester and process for its preparation

HOECHST AG0 citations51
US4207110AJun 10, 1980

Diazotype material

HOECHST AG1 citations50

AGFA GEVAERT AG

1 patent