Inventor
KOYAMA KIYOMI
JP15 patents
⚠️ This page may combine multiple inventors who share the name “KOYAMA KIYOMI”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
TOSHIBA KK
13 patentsUS6077310AJun 20, 2000
Optical proximity correction system
TOSHIBA KK534 citations98
US5538815AJul 23, 1996
Method for designing phase-shifting masks with automatization capability
TOSHIBA KK183 citations98
US5879844AMar 9, 1999
Optical proximity correction method
TOSHIBA KK262 citations97
US6047116AApr 4, 2000
Method for generating exposure data for lithographic apparatus
TOSHIBA KK62 citations96
US5761075AJun 2, 1998
Apparatus for designing photomasks
TOSHIBA KK107 citations95
US6004701ADec 21, 1999
Method for designing Levenson photomask
TOSHIBA KK45 citations92
US4914304AApr 3, 1990
Charged-beam exposure system
TOSHIBA KK36 citations92
US5541025AJul 30, 1996
Method and apparatus for designing photomasks
TOSHIBA KK21 citations90
US6447355B1Sep 10, 2002
Impregnated-type cathode substrate with large particle diameter low porosity region and small particle diameter high porosity region
TOSHIBA KK7 citations72
US6034469AMar 7, 2000
Impregnated type cathode assembly, cathode substrate for use in the assembly, electron gun using the assembly, and electron tube using the cathode assembly
TOSHIBA KK10 citations72
US7047094B2May 16, 2006
LSI mask manufacturing system, LSI mask manufacturing method and LSI mask manufacturing program
TOSHIBA KK4 citations62
US5795683AAug 18, 1998
Method and a system for designing a photomask for use in manufacture of a semiconductor device
TOSHIBA KK5 citations62
US6304024B1Oct 16, 2001
Impregnated-type cathode substrate with large particle diameter low porosity region and small particle diameter high porosity region
TOSHIBA KK4 citations61