Inventor

STRANG ERIC J

US58 patents

⚠️ This page may combine multiple inventors who share the name “STRANG ERIC J”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

STRANG ERIC J

TOKYO ELECTRON LTD

Temperature controlled substrate holder with non-uniform insulation layer for a substrate processing system

Pulsed plasma processing method and apparatus

Method of and apparatus for tunable gas injection in a plasma processing system

Multi-zone resistance heater

Apparatus for active temperature control of susceptors

Method and apparatus for improved plasma processing uniformity

Monitoring erosion of system components by optical emission

Monitoring material buildup on system components by optical emission

High rate atomic layer deposition apparatus and method of using

Method and system for controlling radical distribution

Method and system for controlling radical distribution

Apparatus and method of gas injection sequencing

Thermally zoned substrate holder assembly

Directed gas injection apparatus for semiconductor processing

Directed gas injection apparatus for semiconductor processing

Apparatus and method for improving microwave coupling to a resonant cavity

Method and apparatus for active temperature control of susceptors

Method to affect spatial distribution of harmonic generation in a capacitive discharge reactor

System and method for using first-principles simulation to characterize a semiconductor manufacturing process

Electrically controlled plasma uniformity in a high density plasma source

Plasma processing apparatus for spatial control of dissociation and ionization

Method and structure to segment RF coupling to silicon electrode

Method of and structure for controlling electrode temperature

System and method for using first-principles simulation to provide virtual sensors that facilitate a semiconductor manufacturing process

System and method for using first-principles simulation to facilitate a semiconductor manufacturing process

Method and apparatus for an improved focus ring in a plasma processing system

System and method for using first-principles simulation to control a semiconductor manufacturing process via a simulation result or a derived empirical model

Method and apparatus for improved baffle plate

Method of adjusting the thickness of an electrode in a plasma processing system

Dry non-plasma treatment system and method of using

Inductively coupled high-density plasma source

Method and system for monitoring component consumption

Method and apparatus for wall film monitoring

Plasma processing apparatus and method of controlling chemistry

Method and apparatus for electron density measurement

Method and apparatus for determining consumable lifetime

Method and system for monitoring component consumption

Method and apparatus for electron density measurement and verifying process status

Apparatus and method for plasma processing

Dry non-plasma treatment system

Method and apparatus for tuning a plasma reactor chamber

Method and system for electron density measurement

STRANG ERIC J

Shower head gas injection apparatus with secondary high pressure pulsed gas injection

System and method for using first-principles simulation to analyze a process performed by a semiconductor processing tool

System and method for using first-principles simulation to control a semiconductor manufacturing process

LEE ERIC M

Method for chemical vapor deposition control

Apparatus for chemical vapor deposition control

FINK STEVEN T

Thermally zoned substrate holder assembly

Thermally zoned substrate holder assembly

TSUKAMOTO YUJI

Temperature controlled substrate holder with non-uniform insulation layer for a substrate processing system