Inventor
KORI MORIS
US21 patents
Patents
21 patentsUS6551929B1Apr 22, 2003
Bifurcated deposition process for depositing refractory metal layers employing atomic layer deposition and chemical vapor deposition techniques
APPLIED MATERIALS INC396 citations99
US6939804B2Sep 6, 2005
Formation of composite tungsten films
APPLIED MATERIALS INC116 citations98
US7709385B2May 4, 2010
Method for depositing tungsten-containing layers by vapor deposition techniques
APPLIED MATERIALS INC33 citations96
US7674715B2Mar 9, 2010
Method for forming tungsten materials during vapor deposition processes
APPLIED MATERIALS INC35 citations96
US7465666B2Dec 16, 2008
Method for forming tungsten materials during vapor deposition processes
APPLIED MATERIALS INC47 citations96
US7465665B2Dec 16, 2008
Method for depositing tungsten-containing layers by vapor deposition techniques
APPLIED MATERIALS INC43 citations96
US7235486B2Jun 26, 2007
Method for forming tungsten materials during vapor deposition processes
APPLIED MATERIALS INC43 citations96
US7115494B2Oct 3, 2006
Method and system for controlling the presence of fluorine in refractory metal layers
APPLIED MATERIALS INC30 citations96
US7101795B1Sep 5, 2006
Method and apparatus for depositing refractory metal layers employing sequential deposition techniques to form a nucleation layer
APPLIED MATERIALS INC50 citations96
US7033922B2Apr 25, 2006
Method and system for controlling the presence of fluorine in refractory metal layers
APPLIED MATERIALS INC30 citations96
US6855368B1Feb 15, 2005
Method and system for controlling the presence of fluorine in refractory metal layers
APPLIED MATERIALS INC58 citations96
US6849545B2Feb 1, 2005
System and method to form a composite film stack utilizing sequential deposition techniques
APPLIED MATERIALS INC54 citations96
US6729824B2May 4, 2004
Dual robot processing system
APPLIED MATERIALS INC59 citations96
US6040011AMar 21, 2000
Substrate support member with a purge gas channel and pumping system
APPLIED MATERIALS INC61 citations96
US7605083B2Oct 20, 2009
Formation of composite tungsten films
APPLIED MATERIALS INC39 citations95
US7846840B2Dec 7, 2010
Method for forming tungsten materials during vapor deposition processes
APPLIED MATERIALS INC19 citations93
US7384867B2Jun 10, 2008
Formation of composite tungsten films
APPLIED MATERIALS INC16 citations92
US7220673B2May 22, 2007
Method for depositing tungsten-containing layers by vapor deposition techniques
APPLIED MATERIALS INC29 citations92
US6174373B1Jan 16, 2001
Non-plasma halogenated gas flow prevent metal residues
APPLIED MATERIALS INC7 citations74
US6070599AJun 6, 2000
Non-plasma halogenated gas flow to prevent metal residues
APPLIED MATERIALS INC10 citations74
US5709772AJan 20, 1998
Non-plasma halogenated gas flow to prevent metal residues
APPLIED MATERIALS INC2 citations63