P

Inventor

YANAGISAWA HIDEYOSHI

JP57 patents
⚠️ This page may combine multiple inventors who share the name “YANAGISAWA HIDEYOSHI”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

SHINETSU CHEMICAL CO

48 patents
US7199256B2Apr 3, 2007

Organosilicon compound, making method, and rubber compounding agent

SHINETSU CHEMICAL CO28 citations93
US7166735B2Jan 23, 2007

Organosilicon compound, making method, and rubber compounding agent

SHINETSU CHEMICAL CO26 citations93
US7041843B2May 9, 2006

Preparation of sulfide chain-bearing organosilicon compounds

SHINETSU CHEMICAL CO25 citations93
US6759545B2Jul 6, 2004

Organosilicon compounds and preparation processes

SHINETSU CHEMICAL CO27 citations93
US6140524AOct 31, 2000

Method for preparing a short-chain polysulfide silane mixture

SHINETSU CHEMICAL CO30 citations93
US5817852AOct 6, 1998

Desulfurization of polysulfide silanes

SHINETSU CHEMICAL CO22 citations93
US7368588B2May 6, 2008

Preparation of sulfide chain-bearing organosilicon compounds

SHINETSU CHEMICAL CO29 citations92
US7355059B2Apr 8, 2008

Preparation of sulfide chain-bearing organosilicon compounds

SHINETSU CHEMICAL CO24 citations92
US5840952ANov 24, 1998

Method of manufacturing 3-mercaptopropylalkoxy silane

SHINETSU CHEMICAL CO44 citations90
US10503067B2Dec 10, 2019

Photosensitive resin composition, photosensitive dry film, photosensitive resin coating, and pattern forming process

SHINETSU CHEMICAL CO8 citations84
US7309797B2Dec 18, 2007

Preparation of sulfide chain-bearing organosilicon compounds

SHINETSU CHEMICAL CO19 citations84
US7288667B2Oct 30, 2007

Preparation of sulfide chain-bearing organosilicon compounds

SHINETSU CHEMICAL CO19 citations84
US7452571B2Nov 18, 2008

Method of sealing semiconductor element mounted on gold-plated printed circuit board

SHINETSU CHEMICAL CO7 citations74
US6777474B2Aug 17, 2004

Preparation of sulfide chain-bearing organosilicon compounds

SHINETSU CHEMICAL CO10 citations74
US6197882B1Mar 6, 2001

Curable resin composition and adhesive

SHINETSU CHEMICAL CO12 citations74
US6114560ASep 5, 2000

Method for preparing a short-chain polysulfide silane mixture

SHINETSU CHEMICAL CO11 citations74
US6015870AJan 18, 2000

Process for preparing polysulfide silanes

SHINETSU CHEMICAL CO10 citations74
US5705665AJan 6, 1998

Organic silicon compounds and process of making

SHINETSU CHEMICAL CO13 citations74
US5523441AJun 4, 1996

Fluorocarbon group-containing organosilane compound

SHINETSU CHEMICAL CO16 citations74
US5142037AAug 25, 1992

Platinum catalyst composition and process for producing the same

SHINETSU CHEMICAL CO7 citations74
US5113004AMay 12, 1992

Organosilicon compounds

SHINETSU CHEMICAL CO6 citations74
US5081200AJan 14, 1992

Low stainable primer composition and method of producing the same

SHINETSU CHEMICAL CO9 citations74
US5017668AMay 21, 1991

Room temperature curable resin composition

SHINETSU CHEMICAL CO8 citations68
US11256174B2Feb 22, 2022

Pattern forming process

SHINETSU CHEMICAL CO0 citations63
US10534262B2Jan 14, 2020

Chemically amplified positive resist composition and patterning process

SHINETSU CHEMICAL CO1 citations63
US8735264B2May 27, 2014

Temporary adhesive composition and method for manufacturing thin wafer using the same

SHINETSU CHEMICAL CO2 citations63
US6011088AJan 4, 2000

Organic silicon compounds, inorganic fillers treated therewith, and electrically insulating compositions

SHINETSU CHEMICAL CO2 citations63
US5247117ASep 21, 1993

Process for removing acidic impurities from alkoxysilanes

SHINETSU CHEMICAL CO5 citations63
US5126467AJun 30, 1992

Modifier for composite materials

SHINETSU CHEMICAL CO3 citations63
US5231207AJul 27, 1993

Organosilicon compound

SHINETSU CHEMICAL CO6 citations60
US9777102B2Oct 3, 2017

Modified novolak phenolic resin, making method, and resist composition

SHINETSU CHEMICAL CO0 citations52
US9606435B2Mar 28, 2017

Method for manufacturing micro-structure and optically patternable sacrificial film-forming composition

SHINETSU CHEMICAL CO0 citations52
US9513550B2Dec 6, 2016

Positive resist composition and pattern forming process

SHINETSU CHEMICAL CO0 citations52
US9012122B2Apr 21, 2015

Modified novolak phenolic resin, making method, and resist composition

SHINETSU CHEMICAL CO1 citations52
US9006465B2Apr 14, 2015

Fluorene compound and process for preparing the same

SHINETSU CHEMICAL CO0 citations52
US6140523AOct 31, 2000

Organosilicon compounds and making method

SHINETSU CHEMICAL CO1 citations52
US5329039AJul 12, 1994

Organosilicon compound

SHINETSU CHEMICAL CO0 citations52
US5231204AJul 27, 1993

Method for preventing coloration of organosilicon compound

SHINETSU CHEMICAL CO0 citations52
US5108971AApr 28, 1992

Platinum catalyst composition and process for producing the same

SHINETSU CHEMICAL CO1 citations52
US10501710B2Dec 10, 2019

Cleaner composition and preparation of thin substrate

SHINETSU CHEMICAL CO0 citations51
US10260027B2Apr 16, 2019

Substrate detergent composition

SHINETSU CHEMICAL CO0 citations51
US9840484B2Dec 12, 2017

Aryl compound and making method

SHINETSU CHEMICAL CO0 citations43
US10007181B2Jun 26, 2018

Chemically amplified positive resist dry film, dry film laminate and method of preparing laminate

SHINETSU CHEMICAL CO0 citations42
US9238708B2Jan 19, 2016

Organosiloxane-modified novolak resin and making method

SHINETSU CHEMICAL CO0 citations42
US9017928B2Apr 28, 2015

Methods for manufacturing resin structure and micro-structure

SHINETSU CHEMICAL CO0 citations42
US9017905B2Apr 28, 2015

Chemically amplified positive resist composition and pattern forming process

SHINETSU CHEMICAL CO0 citations42
US8951717B2Feb 10, 2015

Methods for manufacturing resin structure and micro-structure

SHINETSU CHEMICAL CO0 citations42
US8357762B2Jan 22, 2013

Organopolysiloxane and making method

SHINETSU CHEMICAL CO0 citations42

TAMA TLO LTD

1 patent

HIRANO YOSHINORI

1 patent

Showing the top 50 of 57 patents by PatentIndex Score.