Inventor
YANAGISAWA HIDEYOSHI
JP57 patents
⚠️ This page may combine multiple inventors who share the name “YANAGISAWA HIDEYOSHI”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
SHINETSU CHEMICAL CO
48 patentsUS7199256B2Apr 3, 2007
Organosilicon compound, making method, and rubber compounding agent
SHINETSU CHEMICAL CO28 citations93
US7166735B2Jan 23, 2007
Organosilicon compound, making method, and rubber compounding agent
SHINETSU CHEMICAL CO26 citations93
US7041843B2May 9, 2006
Preparation of sulfide chain-bearing organosilicon compounds
SHINETSU CHEMICAL CO25 citations93
US6759545B2Jul 6, 2004
Organosilicon compounds and preparation processes
SHINETSU CHEMICAL CO27 citations93
US6140524AOct 31, 2000
Method for preparing a short-chain polysulfide silane mixture
SHINETSU CHEMICAL CO30 citations93
US5817852AOct 6, 1998
Desulfurization of polysulfide silanes
SHINETSU CHEMICAL CO22 citations93
US7368588B2May 6, 2008
Preparation of sulfide chain-bearing organosilicon compounds
SHINETSU CHEMICAL CO29 citations92
US7355059B2Apr 8, 2008
Preparation of sulfide chain-bearing organosilicon compounds
SHINETSU CHEMICAL CO24 citations92
US5840952ANov 24, 1998
Method of manufacturing 3-mercaptopropylalkoxy silane
SHINETSU CHEMICAL CO44 citations90
US10503067B2Dec 10, 2019
Photosensitive resin composition, photosensitive dry film, photosensitive resin coating, and pattern forming process
SHINETSU CHEMICAL CO8 citations84
US7309797B2Dec 18, 2007
Preparation of sulfide chain-bearing organosilicon compounds
SHINETSU CHEMICAL CO19 citations84
US7288667B2Oct 30, 2007
Preparation of sulfide chain-bearing organosilicon compounds
SHINETSU CHEMICAL CO19 citations84
US7452571B2Nov 18, 2008
Method of sealing semiconductor element mounted on gold-plated printed circuit board
SHINETSU CHEMICAL CO7 citations74
US6777474B2Aug 17, 2004
Preparation of sulfide chain-bearing organosilicon compounds
SHINETSU CHEMICAL CO10 citations74
US6197882B1Mar 6, 2001
Curable resin composition and adhesive
SHINETSU CHEMICAL CO12 citations74
US6114560ASep 5, 2000
Method for preparing a short-chain polysulfide silane mixture
SHINETSU CHEMICAL CO11 citations74
US6015870AJan 18, 2000
Process for preparing polysulfide silanes
SHINETSU CHEMICAL CO10 citations74
US5705665AJan 6, 1998
Organic silicon compounds and process of making
SHINETSU CHEMICAL CO13 citations74
US5523441AJun 4, 1996
Fluorocarbon group-containing organosilane compound
SHINETSU CHEMICAL CO16 citations74
US5142037AAug 25, 1992
Platinum catalyst composition and process for producing the same
SHINETSU CHEMICAL CO7 citations74
US5113004AMay 12, 1992
Organosilicon compounds
SHINETSU CHEMICAL CO6 citations74
US5081200AJan 14, 1992
Low stainable primer composition and method of producing the same
SHINETSU CHEMICAL CO9 citations74
US5017668AMay 21, 1991
Room temperature curable resin composition
SHINETSU CHEMICAL CO8 citations68
US11256174B2Feb 22, 2022
Pattern forming process
SHINETSU CHEMICAL CO0 citations63
US10534262B2Jan 14, 2020
Chemically amplified positive resist composition and patterning process
SHINETSU CHEMICAL CO1 citations63
US8735264B2May 27, 2014
Temporary adhesive composition and method for manufacturing thin wafer using the same
SHINETSU CHEMICAL CO2 citations63
US6011088AJan 4, 2000
Organic silicon compounds, inorganic fillers treated therewith, and electrically insulating compositions
SHINETSU CHEMICAL CO2 citations63
US5247117ASep 21, 1993
Process for removing acidic impurities from alkoxysilanes
SHINETSU CHEMICAL CO5 citations63
US5126467AJun 30, 1992
Modifier for composite materials
SHINETSU CHEMICAL CO3 citations63
US5231207AJul 27, 1993
Organosilicon compound
SHINETSU CHEMICAL CO6 citations60
US9777102B2Oct 3, 2017
Modified novolak phenolic resin, making method, and resist composition
SHINETSU CHEMICAL CO0 citations52
US9606435B2Mar 28, 2017
Method for manufacturing micro-structure and optically patternable sacrificial film-forming composition
SHINETSU CHEMICAL CO0 citations52
US9513550B2Dec 6, 2016
Positive resist composition and pattern forming process
SHINETSU CHEMICAL CO0 citations52
US9012122B2Apr 21, 2015
Modified novolak phenolic resin, making method, and resist composition
SHINETSU CHEMICAL CO1 citations52
US9006465B2Apr 14, 2015
Fluorene compound and process for preparing the same
SHINETSU CHEMICAL CO0 citations52
US6140523AOct 31, 2000
Organosilicon compounds and making method
SHINETSU CHEMICAL CO1 citations52
US5329039AJul 12, 1994
Organosilicon compound
SHINETSU CHEMICAL CO0 citations52
US5231204AJul 27, 1993
Method for preventing coloration of organosilicon compound
SHINETSU CHEMICAL CO0 citations52
US5108971AApr 28, 1992
Platinum catalyst composition and process for producing the same
SHINETSU CHEMICAL CO1 citations52
US10501710B2Dec 10, 2019
Cleaner composition and preparation of thin substrate
SHINETSU CHEMICAL CO0 citations51
US10260027B2Apr 16, 2019
Substrate detergent composition
SHINETSU CHEMICAL CO0 citations51
US9840484B2Dec 12, 2017
Aryl compound and making method
SHINETSU CHEMICAL CO0 citations43
US10007181B2Jun 26, 2018
Chemically amplified positive resist dry film, dry film laminate and method of preparing laminate
SHINETSU CHEMICAL CO0 citations42
US9238708B2Jan 19, 2016
Organosiloxane-modified novolak resin and making method
SHINETSU CHEMICAL CO0 citations42
US9017928B2Apr 28, 2015
Methods for manufacturing resin structure and micro-structure
SHINETSU CHEMICAL CO0 citations42
US9017905B2Apr 28, 2015
Chemically amplified positive resist composition and pattern forming process
SHINETSU CHEMICAL CO0 citations42
US8951717B2Feb 10, 2015
Methods for manufacturing resin structure and micro-structure
SHINETSU CHEMICAL CO0 citations42
US8357762B2Jan 22, 2013
Organopolysiloxane and making method
SHINETSU CHEMICAL CO0 citations42
TAMA TLO LTD
1 patentHIRANO YOSHINORI
1 patentShowing the top 50 of 57 patents by PatentIndex Score.