Inventor

HAN TAEJOON

US17 patents

⚠️ This page may combine multiple inventors who share the name “HAN TAEJOON”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

HAN TAEJOON

LAM RES CORP

Wafer area pressure control for plasma confinement

Wafer area pressure control for plasma confinement

Methods of and apparatus for reducing amounts of particles on a wafer during wafer de-chucking

Wafer area pressure control for plasma confinement

Pre-endpoint techniques in photoresist etching

Waferless automatic cleaning after barrier removal

GLOBALFOUNDRIES INC

Semiconductor structures with coplanar recessed gate layers and fabrication methods

Integrated circuits having replacement metal gates with improved threshold voltage performance and methods for fabricating the same

Integrated circuits having laterally confined epitaxial material overlying fin structures and methods for fabricating same

Methods for fabricating integrated circuits with improved patterning schemes

Facilitating mask pattern formation

Feature etching using varying supply of power pulses

TOKYO ELECTRON LTD

Computed tomography using intersecting views of plasma using optical emission spectroscopy during plasma processing

Generation of a map of a substrate using iterative calculations of non-measured attribute data

CHO SANGJUN

In-situ photoresist strip during plasma etching of active hard mask

In-situ photoresist strip during plasma etching of active hard mask

KANG SEAN S

Trilayer resist organic layer etch