Inventor
BISCHOFF JOERG
DE24 patents
⚠️ This page may combine multiple inventors who share the name “BISCHOFF JOERG”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
TIMBRE TECH INC
13 patentsUS6772084B2Aug 3, 2004
Overlay measurements using periodic gratings
TIMBRE TECH INC203 citations99
US7224471B2May 29, 2007
Azimuthal scanning of a structure formed on a semiconductor wafer
TIMBRE TECH INC45 citations96
US6775015B2Aug 10, 2004
Optical metrology of single features
TIMBRE TECH INC42 citations96
US7388677B2Jun 17, 2008
Optical metrology optimization for repetitive structures
TIMBRE TECH INC26 citations92
US7274472B2Sep 25, 2007
Resolution enhanced optical metrology
TIMBRE TECH INC20 citations92
US7046375B2May 16, 2006
Edge roughness measurement in optical metrology
TIMBRE TECH INC41 citations92
US6947141B2Sep 20, 2005
Overlay measurements using zero-order cross polarization measurements
TIMBRE TECH INC37 citations92
US6804005B2Oct 12, 2004
Overlay measurements using zero-order cross polarization measurements
TIMBRE TECH INC38 citations92
US7030999B2Apr 18, 2006
Optical metrology of single features
TIMBRE TECH INC11 citations84
US7414733B2Aug 19, 2008
Azimuthal scanning of a structure formed on a semiconductor wafer
TIMBRE TECH INC7 citations74
US7379192B2May 27, 2008
Optical metrology of single features
TIMBRE TECH INC6 citations74
US7427521B2Sep 23, 2008
Generating simulated diffraction signals for two-dimensional structures
TIMBRE TECH INC6 citations63
US7274465B2Sep 25, 2007
Optical metrology of a structure formed on a semiconductor wafer using optical pulses
TIMBRE TECH INC3 citations63
TOKYO ELECTRON LTD
8 patentsUS7949618B2May 24, 2011
Training a machine learning system to determine photoresist parameters
TOKYO ELECTRON LTD10 citations82
US7567353B2Jul 28, 2009
Automated process control using optical metrology and photoresist parameters
TOKYO ELECTRON LTD10 citations82
US7630873B2Dec 8, 2009
Approximating eigensolutions for use in determining the profile of a structure formed on a semiconductor wafer
TOKYO ELECTRON LTD4 citations63
US7616325B2Nov 10, 2009
Optical metrology optimization for repetitive structures
TOKYO ELECTRON LTD3 citations63
US7586623B2Sep 8, 2009
Optical metrology of single features
TOKYO ELECTRON LTD2 citations63
US7728976B2Jun 1, 2010
Determining photoresist parameters using optical metrology
TOKYO ELECTRON LTD4 citations60
US7598099B2Oct 6, 2009
Method of controlling a fabrication process using an iso-dense bias
TOKYO ELECTRON LTD4 citations60
US7639370B2Dec 29, 2009
Apparatus for deriving an iso-dense bias
TOKYO ELECTRON LTD1 citations49