Inventor
WU CHUNYI
US25 patents
⚠️ This page may combine multiple inventors who share the name “WU CHUNYI”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
ROHM & HAAS ELECT MAT
12 patentsUS7662981B2Feb 16, 2010
Leveler compounds
ROHM & HAAS ELECT MAT19 citations92
US7510639B2Mar 31, 2009
Leveler compounds
ROHM & HAAS ELECT MAT20 citations92
US9274427B2Mar 1, 2016
Compositions and processes for photolithography
ROHM & HAAS ELECT MAT2 citations62
US10719014B2Jul 21, 2020
Photoresists comprising amide component
ROHM & HAAS ELECT MAT0 citations52
US10558122B2Feb 11, 2020
Compositions comprising sulfonamide material and processes for photolithography
ROHM & HAAS ELECT MAT0 citations52
US10527934B2Jan 7, 2020
Photoresists comprising ionic compound
ROHM & HAAS ELECT MAT0 citations52
US9475763B2Oct 25, 2016
Photoresist comprising nitrogen-containing compound
ROHM & HAAS ELECT MAT0 citations52
US10133179B2Nov 20, 2018
Pattern treatment methods
ROHM & HAAS ELECT MAT1 citations51
US11940731B2Mar 26, 2024
Photoresist topcoat compositions and methods of processing photoresist compositions
ROHM & HAAS ELECT MAT0 citations50
US11846885B2Dec 19, 2023
Topcoat compositions and photolithographic methods
ROHM & HAAS ELECT MAT0 citations50
US12234369B2Feb 25, 2025
Photoresist topcoat compositions and methods of processing photoresist compositions
ROHM & HAAS ELECT MAT0 citations49
US11809077B2Nov 7, 2023
Photoresist compositions and pattern formation methods
ROHM & HAAS ELECT MAT0 citations48
WANG DEYAN
9 patentsUS8241832B2Aug 14, 2012
Compositions and processes for photolithography
WANG DEYAN25 citations92
US8722825B2May 13, 2014
Surface active additive and photoresist composition comprising same
WANG DEYAN4 citations73
US8883400B2Nov 11, 2014
Compositions and processes for photolithography
WANG DEYAN2 citations62
US9122159B2Sep 1, 2015
Compositions and processes for photolithography
WANG DEYAN1 citations52
US9005880B2Apr 14, 2015
Compositions comprising sulfonamide material and processes for photolithography
WANG DEYAN1 citations52
US8808967B2Aug 19, 2014
Compositions and processes for photolithography
WANG DEYAN0 citations52
US8748080B2Jun 10, 2014
Compositions and processes for photolithography
WANG DEYAN1 citations52
US9436082B2Sep 6, 2016
Compositions comprising base-reactive component and processes for photolithography
WANG DEYAN1 citations51
US9507260B2Nov 29, 2016
Compositions and processes for photolithography
WANG DEYAN0 citations41