Inventor

JOHNSON WAYNE L

US59 patents

⚠️ This page may combine multiple inventors who share the name “JOHNSON WAYNE L”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

JOHNSON WAYNE L

TOKYO ELECTRON LTD

Pulsed plasma processing method and apparatus

Multi-zone resistance heater

Device and method for detecting and preventing arcing in RF plasma systems

Electrical impedance matching system and method

Apparatus for active temperature control of susceptors

Segmented electrode apparatus for plasma processing

Apparatus and method for utilizing a plasma density gradient to produce a flow of particles

Chuck transport method and system

Method and apparatus for active temperature control of susceptors

Hall effect ion source at high current density

Method and apparatus for depositing films

Radio frequency power source for generating an inductively coupled plasma

Fluid dielectric variable capacitor

Large area plasma source

Reduced impedance chamber

All-surface biasable and/or temperature-controlled electrostatically-shielded RF plasma source

ESRF chamber cooling system and process

Apparatus and method for adjusting density distribution of a plasma

Method and device for removing harmonics in semiconductor plasma processing systems

Electrically controlled plasma uniformity in a high density plasma source

Electron density measurement and plasma process control system using changes in the resonant frequency of an open resonator containing the plasma

Method and device for attenuating harmonics in semiconductor plasma processing systems

Electron density measurement and plasma process control system using a microwave oscillator locked to an open resonator containing the plasma

Electron density measurement and control system using plasma-induced changes in the frequency of a microwave oscillator

Method of wafer band-edge measurement using transmission spectroscopy and a process for controlling the temperature uniformity of a wafer

Method of and structure for controlling electrode temperature

Optical monitoring and control system and method for plasma reactors

Rapid thermal processing lamp and method for manufacturing the same

High speed stripping for damaged photoresist

Apparatus for measuring temperatures of a wafer using specular reflection spectroscopy

Method of adjusting the thickness of an electrode in a plasma processing system

Structure and the method for measuring the spectral content of an electric field as a function of position inside a plasma

Measuring plasma uniformity in-situ at wafer level

Method of fabricating oxides with low defect densities

Optical monitoring and control system and method for plasma reactors

Linear inductive plasma pump for process reactors

System for automatic control of the wall bombardment to control wall deposition

ESRF coolant degassing process

Applied plasma duct system

Plasma vacuum pump

Esrf source for ion plating epitaxial deposition

Active control of electron temperature in an electrostatically shielded radio frequency plasma source

TOWN COMPASS LLC

Displaying hierarchial relationship of data accessed via subject index

Organizing and storing hierarchical data in a database having dual structures

EPSILON LP

Method and apparatus for substrate heating in an axially symmetric epitaxial deposition apparatus

Process for epitaxial deposition of silicon

AMERICAN TELEPHONE & TELEGRAPH

Processes depending on plasma generation using a helical resonator

JOHNSON WAYNE L

Plasma generating apparatus employing capacitive shielding and process for using such apparatus

EPSILON LTD PARTNERSHIP

Method and apparatus for substrate heating in an axially symmetric epitaxial deposition apparatus

EPSILON

Apparatus for chemical vapor deposition using an axially symmetric gas flow