Inventor
RHODES HOWARD
US46 patents
⚠️ This page may combine multiple inventors who share the name “RHODES HOWARD”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
MICRON TECHNOLOGY INC
36 patentsUS6518610B2Feb 11, 2003
Rhodium-rich oxygen barriers
MICRON TECHNOLOGY INC104 citations99
US7091536B2Aug 15, 2006
Isolation process and structure for CMOS imagers
MICRON TECHNOLOGY INC45 citations96
US6949445B2Sep 27, 2005
Method of forming angled implant for trench isolation
MICRON TECHNOLOGY INC43 citations96
US6888214B2May 3, 2005
Isolation techniques for reducing dark current in CMOS image sensors
MICRON TECHNOLOGY INC62 citations96
US6878568B1Apr 12, 2005
CMOS imager and method of formation
MICRON TECHNOLOGY INC34 citations96
US6818930B2Nov 16, 2004
Gated isolation structure for imagers
MICRON TECHNOLOGY INC43 citations96
US5827770AOct 27, 1998
Method of making a semiconductor device having improved contacts to a thin conductive layer
MICRON TECHNOLOGY INC40 citations96
US6960796B2Nov 1, 2005
CMOS imager pixel designs with storage capacitor
MICRON TECHNOLOGY INC42 citations95
US7439155B2Oct 21, 2008
Isolation techniques for reducing dark current in CMOS image sensors
MICRON TECHNOLOGY INC14 citations93
US7087944B2Aug 8, 2006
Image sensor having a charge storage region provided within an implant region
MICRON TECHNOLOGY INC16 citations93
US6969631B2Nov 29, 2005
Method of forming photodiode with self-aligned implants for high quantum efficiency
MICRON TECHNOLOGY INC23 citations93
US6458714B1Oct 1, 2002
Method of selective oxidation in semiconductor manufacture
MICRON TECHNOLOGY INC53 citations93
US5661045AAug 26, 1997
Method for forming and tailoring the electrical characteristics of semiconductor devices
MICRON TECHNOLOGY INC28 citations93
US5405788AApr 11, 1995
Method for forming and tailoring the electrical characteristics of semiconductor devices
MICRON TECHNOLOGY INC31 citations93
US7102180B2Sep 5, 2006
CMOS imager pixel designs
MICRON TECHNOLOGY INC26 citations92
US7391066B2Jun 24, 2008
Imager floating diffusion region and process for forming same
MICRON TECHNOLOGY INC16 citations84
US7531379B2May 12, 2009
Method of forming CMOS imager with capacitor structures
MICRON TECHNOLOGY INC8 citations83
US7732247B2Jun 8, 2010
Isolation techniques for reducing dark current in CMOS image sensors
MICRON TECHNOLOGY INC4 citations74
US7239003B2Jul 3, 2007
Isolation techniques for reducing dark current in CMOS image sensors
MICRON TECHNOLOGY INC4 citations74
US7217589B2May 15, 2007
Deep photodiode isolation process
MICRON TECHNOLOGY INC8 citations74
US7038263B2May 2, 2006
Integrated circuits with rhodium-rich structures
MICRON TECHNOLOGY INC4 citations74
US6781175B2Aug 24, 2004
Rhodium-rich integrated circuit capacitor electrode
MICRON TECHNOLOGY INC6 citations74
US6740554B2May 25, 2004
Methods to form rhodium-rich oxygen barriers
MICRON TECHNOLOGY INC5 citations74
US6398923B1Jun 4, 2002
Multiple species sputtering method
MICRON TECHNOLOGY INC7 citations72
US5750012AMay 12, 1998
Multiple species sputtering for improved bottom coverage and improved sputter rate
MICRON TECHNOLOGY INC13 citations72
US7326607B2Feb 5, 2008
Imager floating diffusion region and process for forming same
MICRON TECHNOLOGY INC6 citations63
US7067442B1Jun 27, 2006
Method to avoid threshold voltage shift in thicker dielectric films
MICRON TECHNOLOGY INC4 citations63
US6630706B2Oct 7, 2003
Localized array threshold voltage implant to enhance charge storage within DRAM memory cells
MICRON TECHNOLOGY INC4 citations63
US6462394B1Oct 8, 2002
Device configured to avoid threshold voltage shift in a dielectric film
MICRON TECHNOLOGY INC2 citations63
US7525134B2Apr 28, 2009
CMOS imager pixel designs
MICRON TECHNOLOGY INC2 citations62
US6083358AJul 4, 2000
Multiple species sputtering for improved bottom coverage and improved sputter rate
MICRON TECHNOLOGY INC1 citations61
US7510897B2Mar 31, 2009
Photodiode with self-aligned implants for high quantum efficiency and method of formation
MICRON TECHNOLOGY INC0 citations52
US7303938B2Dec 4, 2007
Gated isolation structure for imagers
MICRON TECHNOLOGY INC0 citations52
US7195947B2Mar 27, 2007
Photodiode with self-aligned implants for high quantum efficiency and method of formation
MICRON TECHNOLOGY INC0 citations52
US6815287B2Nov 9, 2004
Localized array threshold voltage implant to enhance charge storage within DRAM memory cells
MICRON TECHNOLOGY INC0 citations52
US6800520B1Oct 5, 2004
Localized array threshold voltage implant enhance charge storage within DRAM memory cells
MICRON TECHNOLOGY INC0 citations52
APTINA IMAGING CORP
6 patentsUS7919797B2Apr 5, 2011
Angled implant for trench isolation
APTINA IMAGING CORP6 citations74
US7811850B2Oct 12, 2010
Method of operating image sensor
APTINA IMAGING CORP3 citations63
US7514715B2Apr 7, 2009
Angled implant for trench isolation
APTINA IMAGING CORP4 citations63
US7470560B2Dec 30, 2008
Image sensor having a charge storage region provided within an implant region
APTINA IMAGING CORP2 citations63
US7750382B2Jul 6, 2010
Image sensor having a charge storage region provided within an implant region
APTINA IMAGING CORP0 citations52
US7745858B2Jun 29, 2010
Photodiode with self-aligned implants for high quantum efficiency and method of formation
APTINA IMAGING CORP0 citations52