P

Inventor

RHODES HOWARD

US46 patents
⚠️ This page may combine multiple inventors who share the name “RHODES HOWARD”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

MICRON TECHNOLOGY INC

36 patents
US6518610B2Feb 11, 2003

Rhodium-rich oxygen barriers

MICRON TECHNOLOGY INC104 citations99
US7091536B2Aug 15, 2006

Isolation process and structure for CMOS imagers

MICRON TECHNOLOGY INC45 citations96
US6949445B2Sep 27, 2005

Method of forming angled implant for trench isolation

MICRON TECHNOLOGY INC43 citations96
US6888214B2May 3, 2005

Isolation techniques for reducing dark current in CMOS image sensors

MICRON TECHNOLOGY INC62 citations96
US6878568B1Apr 12, 2005

CMOS imager and method of formation

MICRON TECHNOLOGY INC34 citations96
US6818930B2Nov 16, 2004

Gated isolation structure for imagers

MICRON TECHNOLOGY INC43 citations96
US5827770AOct 27, 1998

Method of making a semiconductor device having improved contacts to a thin conductive layer

MICRON TECHNOLOGY INC40 citations96
US6960796B2Nov 1, 2005

CMOS imager pixel designs with storage capacitor

MICRON TECHNOLOGY INC42 citations95
US7439155B2Oct 21, 2008

Isolation techniques for reducing dark current in CMOS image sensors

MICRON TECHNOLOGY INC14 citations93
US7087944B2Aug 8, 2006

Image sensor having a charge storage region provided within an implant region

MICRON TECHNOLOGY INC16 citations93
US6969631B2Nov 29, 2005

Method of forming photodiode with self-aligned implants for high quantum efficiency

MICRON TECHNOLOGY INC23 citations93
US6458714B1Oct 1, 2002

Method of selective oxidation in semiconductor manufacture

MICRON TECHNOLOGY INC53 citations93
US5661045AAug 26, 1997

Method for forming and tailoring the electrical characteristics of semiconductor devices

MICRON TECHNOLOGY INC28 citations93
US5405788AApr 11, 1995

Method for forming and tailoring the electrical characteristics of semiconductor devices

MICRON TECHNOLOGY INC31 citations93
US7102180B2Sep 5, 2006

CMOS imager pixel designs

MICRON TECHNOLOGY INC26 citations92
US7391066B2Jun 24, 2008

Imager floating diffusion region and process for forming same

MICRON TECHNOLOGY INC16 citations84
US7531379B2May 12, 2009

Method of forming CMOS imager with capacitor structures

MICRON TECHNOLOGY INC8 citations83
US7732247B2Jun 8, 2010

Isolation techniques for reducing dark current in CMOS image sensors

MICRON TECHNOLOGY INC4 citations74
US7239003B2Jul 3, 2007

Isolation techniques for reducing dark current in CMOS image sensors

MICRON TECHNOLOGY INC4 citations74
US7217589B2May 15, 2007

Deep photodiode isolation process

MICRON TECHNOLOGY INC8 citations74
US7038263B2May 2, 2006

Integrated circuits with rhodium-rich structures

MICRON TECHNOLOGY INC4 citations74
US6781175B2Aug 24, 2004

Rhodium-rich integrated circuit capacitor electrode

MICRON TECHNOLOGY INC6 citations74
US6740554B2May 25, 2004

Methods to form rhodium-rich oxygen barriers

MICRON TECHNOLOGY INC5 citations74
US6398923B1Jun 4, 2002

Multiple species sputtering method

MICRON TECHNOLOGY INC7 citations72
US5750012AMay 12, 1998

Multiple species sputtering for improved bottom coverage and improved sputter rate

MICRON TECHNOLOGY INC13 citations72
US7326607B2Feb 5, 2008

Imager floating diffusion region and process for forming same

MICRON TECHNOLOGY INC6 citations63
US7067442B1Jun 27, 2006

Method to avoid threshold voltage shift in thicker dielectric films

MICRON TECHNOLOGY INC4 citations63
US6630706B2Oct 7, 2003

Localized array threshold voltage implant to enhance charge storage within DRAM memory cells

MICRON TECHNOLOGY INC4 citations63
US6462394B1Oct 8, 2002

Device configured to avoid threshold voltage shift in a dielectric film

MICRON TECHNOLOGY INC2 citations63
US7525134B2Apr 28, 2009

CMOS imager pixel designs

MICRON TECHNOLOGY INC2 citations62
US6083358AJul 4, 2000

Multiple species sputtering for improved bottom coverage and improved sputter rate

MICRON TECHNOLOGY INC1 citations61
US7510897B2Mar 31, 2009

Photodiode with self-aligned implants for high quantum efficiency and method of formation

MICRON TECHNOLOGY INC0 citations52
US7303938B2Dec 4, 2007

Gated isolation structure for imagers

MICRON TECHNOLOGY INC0 citations52
US7195947B2Mar 27, 2007

Photodiode with self-aligned implants for high quantum efficiency and method of formation

MICRON TECHNOLOGY INC0 citations52
US6815287B2Nov 9, 2004

Localized array threshold voltage implant to enhance charge storage within DRAM memory cells

MICRON TECHNOLOGY INC0 citations52
US6800520B1Oct 5, 2004

Localized array threshold voltage implant enhance charge storage within DRAM memory cells

MICRON TECHNOLOGY INC0 citations52

APTINA IMAGING CORP

6 patents

OMNIVISION TECH INC

1 patent

LYU JEONG-HO

1 patent

THAKUR RANDHIR P S

1 patent

MAO DULI

1 patent