Inventor
WEICHERT HEIKO
DE5 patents
Patents
5 patentsUS7445446B2Nov 4, 2008
Method for in-line monitoring and controlling in heat-treating of resist coated wafers
TOKYO ELECTRON LTD8 citations63
US8346506B2Jan 1, 2013
Transforming metrology data from a semiconductor treatment system using multivariate analysis
TOKYO ELECTRON LTD4 citations60
US7598099B2Oct 6, 2009
Method of controlling a fabrication process using an iso-dense bias
TOKYO ELECTRON LTD4 citations60
US7884950B2Feb 8, 2011
Substrate processing method, program, computer-readable storage medium, and substrate processing system
TOKYO ELECTRON LTD0 citations51
US7639370B2Dec 29, 2009
Apparatus for deriving an iso-dense bias
TOKYO ELECTRON LTD1 citations49