P

Inventor

KAUSHAL SANJEEV

US34 patents
⚠️ This page may combine multiple inventors who share the name “KAUSHAL SANJEEV”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

TOKYO ELECTRON LTD

27 patents
US7101816B2Sep 5, 2006

Methods for adaptive real time control of a thermal processing system

TOKYO ELECTRON LTD33 citations92
US7025280B2Apr 11, 2006

Adaptive real time control of a reticle/mask system

TOKYO ELECTRON LTD41 citations92
US9424528B2Aug 23, 2016

Method and apparatus for self-learning and self-improving a semiconductor manufacturing tool

TOKYO ELECTRON LTD11 citations84
US9396443B2Jul 19, 2016

System and method for learning and/or optimizing manufacturing processes

TOKYO ELECTRON LTD6 citations84
US8744607B2Jun 3, 2014

Method and apparatus for self-learning and self-improving a semiconductor manufacturing tool

TOKYO ELECTRON LTD12 citations84
US7452793B2Nov 18, 2008

Wafer curvature estimation, monitoring, and compensation

TOKYO ELECTRON LTD15 citations84
US7737051B2Jun 15, 2010

Silicon germanium surface layer for high-k dielectric integration

TOKYO ELECTRON LTD8 citations83
US7165011B1Jan 16, 2007

Built-in self test for a thermal processing system

TOKYO ELECTRON LTD11 citations82
US7561269B2Jul 14, 2009

Optical measurement system with systematic error correction

TOKYO ELECTRON LTD8 citations81
US8026113B2Sep 27, 2011

Method of monitoring a semiconductor processing system using a wireless sensor network

TOKYO ELECTRON LTD17 citations79
US7342244B2Mar 11, 2008

Spintronic transistor

TOKYO ELECTRON LTD13 citations79
US7519885B2Apr 14, 2009

Monitoring a monolayer deposition (MLD) system using a built-in self test (BIST) table

TOKYO ELECTRON LTD7 citations74
US10133265B2Nov 20, 2018

Method and apparatus for autonomous identification of particle contamination due to isolated process events and systematic trends

TOKYO ELECTRON LTD2 citations71
US7710565B2May 4, 2010

Method of correcting systematic error in a metrology system

TOKYO ELECTRON LTD7 citations71
US9746849B2Aug 29, 2017

Method and apparatus for autonomous tool parameter impact identification system for semiconductor manufacturing

TOKYO ELECTRON LTD3 citations70
US7838072B2Nov 23, 2010

Method and apparatus for monolayer deposition (MLD)

TOKYO ELECTRON LTD7 citations63
US7526699B2Apr 28, 2009

Method for creating a built-in self test (BIST) table for monitoring a monolayer deposition (MLD) system

TOKYO ELECTRON LTD5 citations63
US7459175B2Dec 2, 2008

Method for monolayer deposition

TOKYO ELECTRON LTD2 citations63
US7444572B2Oct 28, 2008

Built-in self test for a thermal processing system

TOKYO ELECTRON LTD4 citations63
US7406644B2Jul 29, 2008

Monitoring a thermal processing system

TOKYO ELECTRON LTD4 citations63
US7340377B2Mar 4, 2008

Monitoring a single-wafer processing system

TOKYO ELECTRON LTD2 citations63
US7302363B2Nov 27, 2007

Monitoring a system during low-pressure processes

TOKYO ELECTRON LTD6 citations63
US9405289B2Aug 2, 2016

Method and apparatus for autonomous identification of particle contamination due to isolated process events and systematic trends

TOKYO ELECTRON LTD2 citations60
US10228678B2Mar 12, 2019

Tool failure analysis using space-distorted similarity

TOKYO ELECTRON LTD1 citations59
US10635993B2Apr 28, 2020

System and method for learning and/or optimizing manufacturing processes

TOKYO ELECTRON LTD0 citations52
US10571900B2Feb 25, 2020

Method and apparatus for autonomous tool parameter impact identification system for semiconductor manufacturing

TOKYO ELECTRON LTD0 citations49
US7141765B2Nov 28, 2006

Heat treating device

TOKYO ELECTRON LTD1 citations49

KAUSHAL SANJEEV

7 patents