P

Inventor

SUGISHIMA KENJI

JP35 patents
⚠️ This page may combine multiple inventors who share the name “SUGISHIMA KENJI”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

TOKYO ELECTRON LTD

18 patents
US7101816B2Sep 5, 2006

Methods for adaptive real time control of a thermal processing system

TOKYO ELECTRON LTD33 citations92
US7025280B2Apr 11, 2006

Adaptive real time control of a reticle/mask system

TOKYO ELECTRON LTD41 citations92
US9424528B2Aug 23, 2016

Method and apparatus for self-learning and self-improving a semiconductor manufacturing tool

TOKYO ELECTRON LTD11 citations84
US8744607B2Jun 3, 2014

Method and apparatus for self-learning and self-improving a semiconductor manufacturing tool

TOKYO ELECTRON LTD12 citations84
US7452793B2Nov 18, 2008

Wafer curvature estimation, monitoring, and compensation

TOKYO ELECTRON LTD15 citations84
US7165011B1Jan 16, 2007

Built-in self test for a thermal processing system

TOKYO ELECTRON LTD11 citations82
US7561269B2Jul 14, 2009

Optical measurement system with systematic error correction

TOKYO ELECTRON LTD8 citations81
US8026113B2Sep 27, 2011

Method of monitoring a semiconductor processing system using a wireless sensor network

TOKYO ELECTRON LTD17 citations79
US7342244B2Mar 11, 2008

Spintronic transistor

TOKYO ELECTRON LTD13 citations79
US7519885B2Apr 14, 2009

Monitoring a monolayer deposition (MLD) system using a built-in self test (BIST) table

TOKYO ELECTRON LTD7 citations74
US7710565B2May 4, 2010

Method of correcting systematic error in a metrology system

TOKYO ELECTRON LTD7 citations71
US7838072B2Nov 23, 2010

Method and apparatus for monolayer deposition (MLD)

TOKYO ELECTRON LTD7 citations63
US7526699B2Apr 28, 2009

Method for creating a built-in self test (BIST) table for monitoring a monolayer deposition (MLD) system

TOKYO ELECTRON LTD5 citations63
US7459175B2Dec 2, 2008

Method for monolayer deposition

TOKYO ELECTRON LTD2 citations63
US7444572B2Oct 28, 2008

Built-in self test for a thermal processing system

TOKYO ELECTRON LTD4 citations63
US7406644B2Jul 29, 2008

Monitoring a thermal processing system

TOKYO ELECTRON LTD4 citations63
US7340377B2Mar 4, 2008

Monitoring a single-wafer processing system

TOKYO ELECTRON LTD2 citations63
US7302363B2Nov 27, 2007

Monitoring a system during low-pressure processes

TOKYO ELECTRON LTD6 citations63

FUJITSU LTD

9 patents

KAUSHAL SANJEEV

7 patents

FUJISU LIMITED

1 patent