Inventor
YAM MARK
US48 patents
⚠️ This page may combine multiple inventors who share the name “YAM MARK”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
APPLIED MATERIALS INC
36 patentsUS6151446ANov 21, 2000
Apparatus and method for thermally processing substrates including a processor using multiple detection signals
APPLIED MATERIALS INC443 citations99
US6987240B2Jan 17, 2006
Thermal flux processing by scanning
APPLIED MATERIALS INC183 citations98
US5660472AAug 26, 1997
Method and apparatus for measuring substrate temperatures
APPLIED MATERIALS INC181 citations98
US5755511AMay 26, 1998
Method and apparatus for measuring substrate temperatures
APPLIED MATERIALS INC107 citations97
US7595208B2Sep 29, 2009
Method of laser annealing using two wavelengths of radiation
APPLIED MATERIALS INC22 citations96
US7279721B2Oct 9, 2007
Dual wavelength thermal flux laser anneal
APPLIED MATERIALS INC46 citations96
US6345909B1Feb 12, 2002
Apparatus for infrared pyrometer calibration in a thermal processing system
APPLIED MATERIALS INC39 citations96
US6179465B1Jan 30, 2001
Method and apparatus for infrared pyrometer calibration in a thermal processing system using multiple light sources
APPLIED MATERIALS INC60 citations96
US5848842ADec 15, 1998
Method of calibrating a temperature measurement system
APPLIED MATERIALS INC76 citations96
US5820261AOct 13, 1998
Method and apparatus for infrared pyrometer calibration in a rapid thermal processing system
APPLIED MATERIALS INC52 citations96
US5762419AJun 9, 1998
Method and apparatus for infrared pyrometer calibration in a thermal processing system
APPLIED MATERIALS INC81 citations96
US6183130B1Feb 6, 2001
Apparatus for substrate temperature measurement using a reflecting cavity and detector
APPLIED MATERIALS INC71 citations94
US6179466B1Jan 30, 2001
Method and apparatus for measuring substrate temperatures
APPLIED MATERIALS INC87 citations94
US6086245AJul 11, 2000
Apparatus for infrared pyrometer calibration in a thermal processing system
APPLIED MATERIALS INC19 citations93
US6056433AMay 2, 2000
Method and apparatus for infrared pyrometer calibration in a thermal processing system
APPLIED MATERIALS INC18 citations93
US5938335AAug 17, 1999
Self-calibrating temperature probe
APPLIED MATERIALS INC23 citations93
US7041931B2May 9, 2006
Stepped reflector plate
APPLIED MATERIALS INC24 citations92
US6226453B1May 1, 2001
Temperature probe with fiber optic core
APPLIED MATERIALS INC38 citations92
US6007241ADec 28, 1999
Apparatus and method for measuring substrate temperature
APPLIED MATERIALS INC36 citations92
US7078302B2Jul 18, 2006
Gate electrode dopant activation method for semiconductor manufacturing including a laser anneal
APPLIED MATERIALS INC28 citations91
US6406179B2Jun 18, 2002
Sensor for measuring a substrate temperature
APPLIED MATERIALS INC35 citations91
US7109087B2Sep 19, 2006
Absorber layer for DSA processing
APPLIED MATERIALS INC20 citations90
US6424880B1Jul 23, 2002
Multi-computer chamber control system, method and medium
APPLIED MATERIALS INC18 citations89
US6500266B1Dec 31, 2002
Heater temperature uniformity qualification tool
APPLIED MATERIALS INC30 citations88
US10857623B2Dec 8, 2020
Annealing apparatus using two wavelengths of radiation
APPLIED MATERIALS INC2 citations84
US9839976B2Dec 12, 2017
Annealing apparatus using two wavelengths of radiation
APPLIED MATERIALS INC3 citations84
US7875829B2Jan 25, 2011
Thermal flux processing by scanning a focused line beam
APPLIED MATERIALS INC7 citations83
US7872209B2Jan 18, 2011
Thermal flux processing by scanning a focused line beam
APPLIED MATERIALS INC8 citations83
US7569463B2Aug 4, 2009
Method of thermal processing structures formed on a substrate
APPLIED MATERIALS INC9 citations83
US7772134B2Aug 10, 2010
Method of annealing using two wavelengths of continuous wave laser radiation
APPLIED MATERIALS INC7 citations74
US11945045B2Apr 2, 2024
Annealing apparatus using two wavelengths of radiation
APPLIED MATERIALS INC0 citations63
US7611976B2Nov 3, 2009
Gate electrode dopant activation method for semiconductor manufacturing
APPLIED MATERIALS INC3 citations61
US7262106B2Aug 28, 2007
Absorber layer for DSA processing
APPLIED MATERIALS INC4 citations60
US6721605B2Apr 13, 2004
Multi-computer chamber control system, method and medium
APPLIED MATERIALS INC2 citations59
US10840100B2Nov 17, 2020
Method of thermal processing structures formed on a substrate
APPLIED MATERIALS INC0 citations51
US9737959B2Aug 22, 2017
Thermal processing by scanning a laser line beam
APPLIED MATERIALS INC0 citations49
JENNINGS DEAN
5 patentsUS8907247B2Dec 9, 2014
Annealing apparatus using two wavelengths of laser radiation
JENNINGS DEAN3 citations73
US8242407B2Aug 14, 2012
Annealing apparatus using two wavelengths of continuous wave laser radiation
JENNINGS DEAN5 citations73
US8765618B2Jul 1, 2014
Annealing apparatus using two wavelengths of continuous wave laser radiation
JENNINGS DEAN0 citations52
US8890024B2Nov 18, 2014
Annealing apparatus using two wavelengths of continuous wave laser radiation
JENNINGS DEAN0 citations51
US8653408B2Feb 18, 2014
Annealing apparatus using two wavelengths of continuous wave laser radiation
JENNINGS DEAN0 citations51