Inventor
PARIHAR VIJAY
US36 patents
⚠️ This page may combine multiple inventors who share the name “PARIHAR VIJAY”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
APPLIED MATERIALS INC
25 patentsUS7429532B2Sep 30, 2008
Semiconductor substrate process using an optically writable carbon-containing mask
APPLIED MATERIALS INC539 citations99
US7422775B2Sep 9, 2008
Process for low temperature plasma deposition of an optical absorption layer and high speed optical annealing
APPLIED MATERIALS INC535 citations99
US7335611B2Feb 26, 2008
Copper conductor annealing process employing high speed optical annealing with a low temperature-deposited optical absorber layer
APPLIED MATERIALS INC535 citations99
US7323401B2Jan 29, 2008
Semiconductor substrate process using a low temperature deposited carbon-containing hard mask
APPLIED MATERIALS INC580 citations99
US7312162B2Dec 25, 2007
Low temperature plasma deposition process for carbon layer deposition
APPLIED MATERIALS INC544 citations99
US7312148B2Dec 25, 2007
Copper barrier reflow process employing high speed optical annealing
APPLIED MATERIALS INC537 citations99
US7109098B1Sep 19, 2006
Semiconductor junction formation process including low temperature plasma deposition of an optical absorption layer and high speed optical annealing
APPLIED MATERIALS INC551 citations99
US7595208B2Sep 29, 2009
Method of laser annealing using two wavelengths of radiation
APPLIED MATERIALS INC22 citations96
US7279721B2Oct 9, 2007
Dual wavelength thermal flux laser anneal
APPLIED MATERIALS INC46 citations96
US7135392B1Nov 14, 2006
Thermal flux laser annealing for ion implantation of semiconductor P-N junctions
APPLIED MATERIALS INC50 citations93
US7129440B2Oct 31, 2006
Single axis light pipe for homogenizing slow axis of illumination systems based on laser diodes
APPLIED MATERIALS INC26 citations93
US10857623B2Dec 8, 2020
Annealing apparatus using two wavelengths of radiation
APPLIED MATERIALS INC2 citations84
US9839976B2Dec 12, 2017
Annealing apparatus using two wavelengths of radiation
APPLIED MATERIALS INC3 citations84
US7674999B2Mar 9, 2010
Fast axis beam profile shaping by collimation lenslets for high power laser diode based annealing system
APPLIED MATERIALS INC11 citations84
US7795124B2Sep 14, 2010
Methods for contact resistance reduction of advanced CMOS devices
APPLIED MATERIALS INC9 citations82
US7772134B2Aug 10, 2010
Method of annealing using two wavelengths of continuous wave laser radiation
APPLIED MATERIALS INC7 citations74
US9879341B2Jan 30, 2018
Method and apparatus for microwave assisted chalcogen radicals generation for 2-D materials
APPLIED MATERIALS INC4 citations73
US11945045B2Apr 2, 2024
Annealing apparatus using two wavelengths of radiation
APPLIED MATERIALS INC0 citations63
US7717617B2May 18, 2010
Multiple band pass filtering for pyrometry in laser based annealing systems
APPLIED MATERIALS INC3 citations63
US7438468B2Oct 21, 2008
Multiple band pass filtering for pyrometry in laser based annealing systems
APPLIED MATERIALS INC4 citations63
US7422988B2Sep 9, 2008
Rapid detection of imminent failure in laser thermal processing of a substrate
APPLIED MATERIALS INC4 citations63
US7588990B2Sep 15, 2009
Dynamic surface annealing of implanted dopants with low temperature HDPCVD process for depositing a high extinction coefficient optical absorber layer
APPLIED MATERIALS INC3 citations60
US7989366B2Aug 2, 2011
Dopant activation in doped semiconductor substrates
APPLIED MATERIALS INC1 citations51
US7968473B2Jun 28, 2011
Low temperature process for depositing a high extinction coefficient non-peeling optical absorber for a scanning laser surface anneal of implanted dopants
APPLIED MATERIALS INC1 citations49
US7659187B2Feb 9, 2010
Method of forming PN junctions including a post-ion implant dynamic surface anneal process with minimum interface trap density at the gate insulator-silicon interface
APPLIED MATERIALS INC0 citations42
JENNINGS DEAN
6 patentsUS8288683B2Oct 16, 2012
Fast axis beam profile shaping for high power laser diode based annealing system
JENNINGS DEAN34 citations92
US8907247B2Dec 9, 2014
Annealing apparatus using two wavelengths of laser radiation
JENNINGS DEAN3 citations73
US8242407B2Aug 14, 2012
Annealing apparatus using two wavelengths of continuous wave laser radiation
JENNINGS DEAN5 citations73
US8765618B2Jul 1, 2014
Annealing apparatus using two wavelengths of continuous wave laser radiation
JENNINGS DEAN0 citations52
US8890024B2Nov 18, 2014
Annealing apparatus using two wavelengths of continuous wave laser radiation
JENNINGS DEAN0 citations51
US8653408B2Feb 18, 2014
Annealing apparatus using two wavelengths of continuous wave laser radiation
JENNINGS DEAN0 citations51