Inventor
YOSHIHARA KOUSUKE
JP94 patents
⚠️ This page may combine multiple inventors who share the name “YOSHIHARA KOUSUKE”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
TOKYO ELECTRON LTD
37 patentsUS9741559B2Aug 22, 2017
Film forming method, computer storage medium, and film forming system
TOKYO ELECTRON LTD466 citations98
US6527860B1Mar 4, 2003
Substrate processing apparatus
TOKYO ELECTRON LTD49 citations96
US6848625B2Feb 1, 2005
Process liquid supply mechanism and process liquid supply method
TOKYO ELECTRON LTD58 citations94
US6673151B2Jan 6, 2004
Substrate processing apparatus
TOKYO ELECTRON LTD32 citations93
US6578772B2Jun 17, 2003
Treatment solution supply apparatus and treatment solution supply method
TOKYO ELECTRON LTD23 citations93
US6869640B2Mar 22, 2005
Coating film forming method and coating film forming apparatus
TOKYO ELECTRON LTD28 citations92
US6811962B2Nov 2, 2004
Method for developing processing and apparatus for supplying developing solution
TOKYO ELECTRON LTD29 citations92
US6709174B2Mar 23, 2004
Apparatus and method for development
TOKYO ELECTRON LTD27 citations92
US9256131B2Feb 9, 2016
Developing method for developing apparatus
TOKYO ELECTRON LTD7 citations84
US8043657B2Oct 25, 2011
Coating treatment method
TOKYO ELECTRON LTD11 citations84
US8026048B2Sep 27, 2011
Developing apparatus and developing method
TOKYO ELECTRON LTD7 citations84
US7918182B2Apr 5, 2011
Developing device and developing method
TOKYO ELECTRON LTD7 citations84
US7820243B2Oct 26, 2010
Resist coating method and resist coating apparatus
TOKYO ELECTRON LTD9 citations84
US7802536B2Sep 28, 2010
Apparatus and method of forming an applied film
TOKYO ELECTRON LTD15 citations84
US9846363B2Dec 19, 2017
Processing liquid supplying apparatus and method of supplying processing liquid
TOKYO ELECTRON LTD7 citations83
US7901514B2Mar 8, 2011
Substrate cleaning method and developing apparatus
TOKYO ELECTRON LTD12 citations83
US7604013B2Oct 20, 2009
Substrate cleaning method and developing apparatus
TOKYO ELECTRON LTD11 citations83
US10068763B2Sep 4, 2018
Coating film forming method, coating film forming apparatus, and storage medium
TOKYO ELECTRON LTD8 citations82
US10048664B2Aug 14, 2018
Coating method, computer storage medium and coating apparatus
TOKYO ELECTRON LTD7 citations82
US7601933B2Oct 13, 2009
Heat processing apparatus and heat processing method
TOKYO ELECTRON LTD8 citations82
US9307653B2Apr 5, 2016
Substrate cleaning method, substrate cleaning apparatus and storage medium for cleaning substrate
TOKYO ELECTRON LTD6 citations73
US9217922B2Dec 22, 2015
Liquid processing apparatus, liquid processing method and storage medium for liquid processing
TOKYO ELECTRON LTD5 citations73
US8678684B2Mar 25, 2014
Developing method
TOKYO ELECTRON LTD4 citations73
US7823534B2Nov 2, 2010
Development device and development method
TOKYO ELECTRON LTD6 citations73
US11342198B2May 24, 2022
Processing liquid supplying apparatus and processing liquid supplying method
TOKYO ELECTRON LTD3 citations72
US10074546B2Sep 11, 2018
Processing liquid supplying apparatus and processing liquid supplying method
TOKYO ELECTRON LTD2 citations72
US9947534B2Apr 17, 2018
Coating treatment method with airflow control, and non-transitory recording medium having program recorded thereon for executing coating treatment with airflow control
TOKYO ELECTRON LTD2 citations72
US9731226B2Aug 15, 2017
Solution treatment apparatus and solution treatment method
TOKYO ELECTRON LTD3 citations72
US9732910B2Aug 15, 2017
Processing-liquid supply apparatus and processing-liquid supply method
TOKYO ELECTRON LTD3 citations72
US9690202B2Jun 27, 2017
Developing method, developing apparatus and storage medium
TOKYO ELECTRON LTD2 citations72
US9613836B2Apr 4, 2017
Coating film forming apparatus, coating film forming method, and recording medium
TOKYO ELECTRON LTD6 citations72
US8791030B2Jul 29, 2014
Coating treatment method and coating treatment apparatus
TOKYO ELECTRON LTD4 citations72
US10734251B2Aug 4, 2020
Liquid processing apparatus, liquid processing method, and storage medium for liquid process
TOKYO ELECTRON LTD5 citations71
US10672606B2Jun 2, 2020
Coating film forming method, coating film forming apparatus, and storage medium
TOKYO ELECTRON LTD5 citations71
US10025190B2Jul 17, 2018
Substrate treatment system
TOKYO ELECTRON LTD2 citations71
US10262880B2Apr 16, 2019
Cover plate for wind mark control in spin coating process
TOKYO ELECTRON LTD4 citations70
US9704730B2Jul 11, 2017
Substrate cleaning apparatus, substrate cleaning method and non-transitory storage medium
TOKYO ELECTRON LTD2 citations69
YOSHIHARA KOUSUKE
5 patentsUS8414972B2Apr 9, 2013
Coating treatment method, coating treatment apparatus, and computer-readable storage medium
YOSHIHARA KOUSUKE5 citations84
US8287954B2Oct 16, 2012
Apparatus and method of forming an applied film
YOSHIHARA KOUSUKE7 citations84
US9162247B2Oct 20, 2015
Coating and development treatment system with airflow control including control unit and movable airflow control plate
YOSHIHARA KOUSUKE11 citations83
US8980013B2Mar 17, 2015
Substrate cleaning method and substrate cleaning apparatus
YOSHIHARA KOUSUKE2 citations63
US8216389B2Jul 10, 2012
Substrate cleaning method and substrate cleaning apparatus
YOSHIHARA KOUSUKE3 citations63
TAKEGUCHI HIROFUMI
2 patentsYAMAMOTO TARO
2 patentsHAYASHI SHINICHI
1 patentTAKIGUCHI YASUSHI
1 patentTAKAYANAGI KOJI
1 patentTOKYO ELECTON LTD
1 patentShowing the top 50 of 94 patents by PatentIndex Score.