Inventor
KYOUDA HIDEHARU
JP32 patents
⚠️ This page may combine multiple inventors who share the name “KYOUDA HIDEHARU”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
TOKYO ELECTRON LTD
24 patentsUS7665916B2Feb 23, 2010
Coater/developer and coating/developing method
TOKYO ELECTRON LTD21 citations92
US6811962B2Nov 2, 2004
Method for developing processing and apparatus for supplying developing solution
TOKYO ELECTRON LTD29 citations92
US6709174B2Mar 23, 2004
Apparatus and method for development
TOKYO ELECTRON LTD27 citations92
US6496245B2Dec 17, 2002
Developing method and developing apparatus
TOKYO ELECTRON LTD23 citations92
US8366872B2Feb 5, 2013
Substrate treatment method, coating film removing apparatus, and substrate treatment system
TOKYO ELECTRON LTD16 citations84
US8026048B2Sep 27, 2011
Developing apparatus and developing method
TOKYO ELECTRON LTD7 citations84
US7959988B2Jun 14, 2011
Coating film forming apparatus and method
TOKYO ELECTRON LTD8 citations84
US7926441B2Apr 19, 2011
Substrate treatment method, coating treatment apparatus, and substrate treatment system
TOKYO ELECTRON LTD13 citations84
US7918182B2Apr 5, 2011
Developing device and developing method
TOKYO ELECTRON LTD7 citations84
US7601933B2Oct 13, 2009
Heat processing apparatus and heat processing method
TOKYO ELECTRON LTD8 citations82
US9214363B2Dec 15, 2015
Coating and developing apparatus, coating film forming method, and storage medium storing program for performing the method
TOKYO ELECTRON LTD4 citations73
US7823534B2Nov 2, 2010
Development device and development method
TOKYO ELECTRON LTD6 citations73
US9947556B2Apr 17, 2018
Substrate cleaning apparatus, substrate cleaning method, and storage medium
TOKYO ELECTRON LTD5 citations72
US6991385B2Jan 31, 2006
Method for developing processing and apparatus for supplying developing solution
TOKYO ELECTRON LTD4 citations63
US8037890B2Oct 18, 2011
Substrate cleaning device and substrate cleaning method
TOKYO ELECTRON LTD5 citations62
US11031261B2Jun 8, 2021
Liquid processing apparatus
TOKYO ELECTRON LTD0 citations60
US8010221B2Aug 30, 2011
Cleaning apparatus and method for immersion light exposure
TOKYO ELECTRON LTD6 citations60
US11524383B2Dec 13, 2022
Substrate processing apparatus, substrate processing method, and computer-readable recording medium
TOKYO ELECTRON LTD0 citations52
US7742146B2Jun 22, 2010
Coating and developing method, coating and developing system and storage medium
TOKYO ELECTRON LTD1 citations52
US10289004B2May 14, 2019
Developing apparatus, developing method and storage medium
TOKYO ELECTRON LTD0 citations51
US10120285B2Nov 6, 2018
Developing method, developing apparatus and storage medium
TOKYO ELECTRON LTD0 citations51
US9575411B2Feb 21, 2017
Developing apparatus, developing method and storage medium
TOKYO ELECTRON LTD0 citations51
US9568829B2Feb 14, 2017
Developing method, developing apparatus and storage medium
TOKYO ELECTRON LTD1 citations51
US10014190B2Jul 3, 2018
Liquid processing apparatus
TOKYO ELECTRON LTD0 citations50