P

Inventor

IWAO FUMIKO

JP11 patents
⚠️ This page may combine multiple inventors who share the name “IWAO FUMIKO”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

TOKYO ELECTRON LTD

7 patents
US9741559B2Aug 22, 2017

Film forming method, computer storage medium, and film forming system

TOKYO ELECTRON LTD466 citations98
US9329483B2May 3, 2016

Film forming method, non-transitory computer storage medium and film forming apparatus

TOKYO ELECTRON LTD7 citations83
US7901514B2Mar 8, 2011

Substrate cleaning method and developing apparatus

TOKYO ELECTRON LTD12 citations83
US7604013B2Oct 20, 2009

Substrate cleaning method and developing apparatus

TOKYO ELECTRON LTD11 citations83
US8791030B2Jul 29, 2014

Coating treatment method and coating treatment apparatus

TOKYO ELECTRON LTD4 citations72
US9341952B2May 17, 2016

Substrate treatment method, non-transitory computer storage medium and substrate treatment system

TOKYO ELECTRON LTD2 citations62
US9280052B2Mar 8, 2016

Substrate treatment method, non-transitory computer storage medium and substrate treatment system

TOKYO ELECTRON LTD2 citations62

IWAO FUMIKO

2 patents
US8530357B2Sep 10, 2013

Method for manufacturing semiconductor device and apparatus for manufacturing semiconductor device

IWAO FUMIKO3 citations57
US8202682B2Jun 19, 2012

Method of manufacturing semiconductor device, and resist coating and developing system

IWAO FUMIKO0 citations37

YOSHIDA HIDEO

1 patent
US6793793B2Sep 21, 2004

Electrochemical treating method such as electroplating and electrochemical reaction device therefor

YOSHIDA HIDEO13 citations81

KOBAYASHI SHINJI

1 patent
US8842257B2Sep 23, 2014

Substrate treatment method, substrate treatment apparatus, and non-transitory computer storage medium

KOBAYASHI SHINJI0 citations40