Inventor
JENG SHIN-PUU
TW728 patents
⚠️ This page may combine multiple inventors who share the name “JENG SHIN-PUU”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
APPLIED MATERIALS INC
19 patentsUS6627532B1Sep 30, 2003
Method of decreasing the K value in SiOC layer deposited by chemical vapor deposition
APPLIED MATERIALS INC358 citations99
US6596655B1Jul 22, 2003
Plasma processes for depositing low dielectric constant films
APPLIED MATERIALS INC77 citations99
US6562690B1May 13, 2003
Plasma processes for depositing low dielectric constant films
APPLIED MATERIALS INC102 citations99
US6541282B1Apr 1, 2003
Plasma processes for depositing low dielectric constant films
APPLIED MATERIALS INC80 citations99
US6511909B1Jan 28, 2003
Method of depositing a low K dielectric with organo silane
APPLIED MATERIALS INC100 citations99
US6511903B1Jan 28, 2003
Method of depositing a low k dielectric with organo silane
APPLIED MATERIALS INC91 citations99
US6413583B1Jul 2, 2002
Formation of a liquid-like silica layer by reaction of an organosilicon compound and a hydroxyl forming compound
APPLIED MATERIALS INC725 citations99
US6348725B2Feb 19, 2002
Plasma processes for depositing low dielectric constant films
APPLIED MATERIALS INC161 citations99
US6303523B2Oct 16, 2001
Plasma processes for depositing low dielectric constant films
APPLIED MATERIALS INC751 citations99
US6072227AJun 6, 2000
Low power method of depositing a low k dielectric with organo silane
APPLIED MATERIALS INC541 citations99
US6054379AApr 25, 2000
Method of depositing a low k dielectric with organo silane
APPLIED MATERIALS INC609 citations99
US6660656B2Dec 9, 2003
Plasma processes for depositing low dielectric constant films
APPLIED MATERIALS INC111 citations98
US6734115B2May 11, 2004
Plasma processes for depositing low dielectric constant films
APPLIED MATERIALS INC67 citations97
US6709715B1Mar 23, 2004
Plasma enhanced chemical vapor deposition of copolymer of parylene N and comonomers with various double bonds
APPLIED MATERIALS INC109 citations97
US6086952AJul 11, 2000
Chemical vapor deposition of a copolymer of p-xylylene and a multivinyl silicon/oxygen comonomer
APPLIED MATERIALS INC93 citations97
US7023092B2Apr 4, 2006
Low dielectric constant film produced from silicon compounds comprising silicon-carbon bonds
APPLIED MATERIALS INC25 citations96
US6869896B2Mar 22, 2005
Plasma processes for depositing low dielectric constant films
APPLIED MATERIALS INC37 citations96
US6770556B2Aug 3, 2004
Method of depositing a low dielectric with organo silane
APPLIED MATERIALS INC29 citations96
US6730593B2May 4, 2004
Method of depositing a low K dielectric with organo silane
APPLIED MATERIALS INC60 citations96
TEXAS INSTRUMENTS INC
15 patentsUS5668398ASep 16, 1997
Multilevel interconnect structure with air gaps formed between metal leads
TEXAS INSTRUMENTS INC106 citations99
US5488015AJan 30, 1996
Method of making an interconnect structure with an integrated low density dielectric
TEXAS INSTRUMENTS INC148 citations99
US5461003AOct 24, 1995
Multilevel interconnect structure with air gaps formed between metal leads
TEXAS INSTRUMENTS INC427 citations99
US5821621AOct 13, 1998
Low capacitance interconnect structure for integrated circuits
TEXAS INSTRUMENTS INC127 citations98
US5708303AJan 13, 1998
Semiconductor device having damascene interconnects
TEXAS INSTRUMENTS INC97 citations98
US5548159AAug 20, 1996
Porous insulator for line-to-line capacitance reduction
TEXAS INSTRUMENTS INC120 citations98
US5955140ASep 21, 1999
Low volatility solvent-based method for forming thin film nanoporous aerogels on semiconductor substrates
TEXAS INSTRUMENTS INC94 citations97
US6380105B1Apr 30, 2002
Low volatility solvent-based method for forming thin film nanoporous aerogels on semiconductor substrates
TEXAS INSTRUMENTS INC50 citations96
US6319852B1Nov 20, 2001
Nanoporous dielectric thin film formation using a post-deposition catalyst
TEXAS INSTRUMENTS INC56 citations96
US6063714AMay 16, 2000
Nanoporous dielectric thin film surface modification
TEXAS INSTRUMENTS INC76 citations96
US6008117ADec 28, 1999
Method of forming diffusion barriers encapsulating copper
TEXAS INSTRUMENTS INC78 citations96
US5936295AAug 10, 1999
Multilevel interconnect structure with air gaps formed between metal leads
TEXAS INSTRUMENTS INC70 citations96
US5892282AApr 6, 1999
Barrier-less plug structure
TEXAS INSTRUMENTS INC46 citations96
US5858871AJan 12, 1999
Porous insulator for line-to-line capacitance reduction
TEXAS INSTRUMENTS INC52 citations96
US5818111AOct 6, 1998
Low capacitance interconnect structures in integrated circuits using a stack of low dielectric materials
TEXAS INSTRUMENTS INC86 citations96
TAIWAN SEMICONDUCTOR MFG
6 patentsUS9372206B2Jun 21, 2016
Testing of semiconductor chips with microbumps
TAIWAN SEMICONDUCTOR MFG1,778 citations99
US9299649B2Mar 29, 2016
3D packages and methods for forming the same
TAIWAN SEMICONDUCTOR MFG902 citations99
US8993380B2Mar 31, 2015
Structure and method for 3D IC package
TAIWAN SEMICONDUCTOR MFG900 citations99
US8802504B1Aug 12, 2014
3D packages and methods for forming the same
TAIWAN SEMICONDUCTOR MFG408 citations99
US8669174B2Mar 11, 2014
Multi-die stacking using bumps with different sizes
TAIWAN SEMICONDUCTOR MFG139 citations99
US7235424B2Jun 26, 2007
Method and apparatus for enhanced CMP planarization using surrounded dummy design
TAIWAN SEMICONDUCTOR MFG150 citations98
TAIWAN SEMICONDUCTOR MFG CO LTD
2 patentsYU CHEN-HUA
1 patentHUNG JUI-PIN
1 patentWU WEI-CHENG
1 patentLIN JING-CHENG
1 patentJENG SHIN-PUU
1 patentSHIH YING-CHING
1 patentHU HSIEN-PIN
1 patentLIU TZUAN-HORNG
1 patentShowing the top 50 of 728 patents by PatentIndex Score.