P

Inventor

JENG SHIN-PUU

TW728 patents
⚠️ This page may combine multiple inventors who share the name “JENG SHIN-PUU”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

APPLIED MATERIALS INC

19 patents
US6627532B1Sep 30, 2003

Method of decreasing the K value in SiOC layer deposited by chemical vapor deposition

APPLIED MATERIALS INC358 citations99
US6596655B1Jul 22, 2003

Plasma processes for depositing low dielectric constant films

APPLIED MATERIALS INC77 citations99
US6562690B1May 13, 2003

Plasma processes for depositing low dielectric constant films

APPLIED MATERIALS INC102 citations99
US6541282B1Apr 1, 2003

Plasma processes for depositing low dielectric constant films

APPLIED MATERIALS INC80 citations99
US6511909B1Jan 28, 2003

Method of depositing a low K dielectric with organo silane

APPLIED MATERIALS INC100 citations99
US6511903B1Jan 28, 2003

Method of depositing a low k dielectric with organo silane

APPLIED MATERIALS INC91 citations99
US6413583B1Jul 2, 2002

Formation of a liquid-like silica layer by reaction of an organosilicon compound and a hydroxyl forming compound

APPLIED MATERIALS INC725 citations99
US6348725B2Feb 19, 2002

Plasma processes for depositing low dielectric constant films

APPLIED MATERIALS INC161 citations99
US6303523B2Oct 16, 2001

Plasma processes for depositing low dielectric constant films

APPLIED MATERIALS INC751 citations99
US6072227AJun 6, 2000

Low power method of depositing a low k dielectric with organo silane

APPLIED MATERIALS INC541 citations99
US6054379AApr 25, 2000

Method of depositing a low k dielectric with organo silane

APPLIED MATERIALS INC609 citations99
US6660656B2Dec 9, 2003

Plasma processes for depositing low dielectric constant films

APPLIED MATERIALS INC111 citations98
US6734115B2May 11, 2004

Plasma processes for depositing low dielectric constant films

APPLIED MATERIALS INC67 citations97
US6709715B1Mar 23, 2004

Plasma enhanced chemical vapor deposition of copolymer of parylene N and comonomers with various double bonds

APPLIED MATERIALS INC109 citations97
US6086952AJul 11, 2000

Chemical vapor deposition of a copolymer of p-xylylene and a multivinyl silicon/oxygen comonomer

APPLIED MATERIALS INC93 citations97
US7023092B2Apr 4, 2006

Low dielectric constant film produced from silicon compounds comprising silicon-carbon bonds

APPLIED MATERIALS INC25 citations96
US6869896B2Mar 22, 2005

Plasma processes for depositing low dielectric constant films

APPLIED MATERIALS INC37 citations96
US6770556B2Aug 3, 2004

Method of depositing a low dielectric with organo silane

APPLIED MATERIALS INC29 citations96
US6730593B2May 4, 2004

Method of depositing a low K dielectric with organo silane

APPLIED MATERIALS INC60 citations96

TEXAS INSTRUMENTS INC

15 patents
US5668398ASep 16, 1997

Multilevel interconnect structure with air gaps formed between metal leads

TEXAS INSTRUMENTS INC106 citations99
US5488015AJan 30, 1996

Method of making an interconnect structure with an integrated low density dielectric

TEXAS INSTRUMENTS INC148 citations99
US5461003AOct 24, 1995

Multilevel interconnect structure with air gaps formed between metal leads

TEXAS INSTRUMENTS INC427 citations99
US5821621AOct 13, 1998

Low capacitance interconnect structure for integrated circuits

TEXAS INSTRUMENTS INC127 citations98
US5708303AJan 13, 1998

Semiconductor device having damascene interconnects

TEXAS INSTRUMENTS INC97 citations98
US5548159AAug 20, 1996

Porous insulator for line-to-line capacitance reduction

TEXAS INSTRUMENTS INC120 citations98
US5955140ASep 21, 1999

Low volatility solvent-based method for forming thin film nanoporous aerogels on semiconductor substrates

TEXAS INSTRUMENTS INC94 citations97
US6380105B1Apr 30, 2002

Low volatility solvent-based method for forming thin film nanoporous aerogels on semiconductor substrates

TEXAS INSTRUMENTS INC50 citations96
US6319852B1Nov 20, 2001

Nanoporous dielectric thin film formation using a post-deposition catalyst

TEXAS INSTRUMENTS INC56 citations96
US6063714AMay 16, 2000

Nanoporous dielectric thin film surface modification

TEXAS INSTRUMENTS INC76 citations96
US6008117ADec 28, 1999

Method of forming diffusion barriers encapsulating copper

TEXAS INSTRUMENTS INC78 citations96
US5936295AAug 10, 1999

Multilevel interconnect structure with air gaps formed between metal leads

TEXAS INSTRUMENTS INC70 citations96
US5892282AApr 6, 1999

Barrier-less plug structure

TEXAS INSTRUMENTS INC46 citations96
US5858871AJan 12, 1999

Porous insulator for line-to-line capacitance reduction

TEXAS INSTRUMENTS INC52 citations96
US5818111AOct 6, 1998

Low capacitance interconnect structures in integrated circuits using a stack of low dielectric materials

TEXAS INSTRUMENTS INC86 citations96

TAIWAN SEMICONDUCTOR MFG

6 patents

TAIWAN SEMICONDUCTOR MFG CO LTD

2 patents

YU CHEN-HUA

1 patent

HUNG JUI-PIN

1 patent

WU WEI-CHENG

1 patent

LIN JING-CHENG

1 patent

JENG SHIN-PUU

1 patent

SHIH YING-CHING

1 patent

HU HSIEN-PIN

1 patent

LIU TZUAN-HORNG

1 patent

Showing the top 50 of 728 patents by PatentIndex Score.