Inventor

LAERMER FRANZ

DE115 patents

⚠️ This page may combine multiple inventors who share the name “LAERMER FRANZ”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

LAERMER FRANZ

BOSCH GMBH ROBERT

Method of anisotropically etching silicon

Anisotropic, fluorine-based plasma etching method for silicon

Method for anisotropic etching of silicon

Acceleration sensing device

Sensor and method for manufacturing a sensor

Method for anisotropic plasma etching of substrates

Method of anisotropic etching of silicon

Process for producing a speed of rotation coriolis sensor

Method and apparatus for anisotropic etching of substrates

Process for anisotropic plasma etching of different substrates

Method of manufacturing sensor

Method for etching structures in an etching body by means of a plasma

Method for anisotropic plasma etching of semiconductors

Method of producing a radiation sensor

Process for making micromechanical structures

Device and method for etching a substrate using an inductively coupled plasma

Micromechanical component and suitable method for its manufacture

Method for processing silicon using etching processes

Electrochemical etching cell

Method for manufacturing breakaway layers for detaching deposited layer systems

Method and device for epitaxial deposition of atoms or molecules from a reactive gas on a deposition surface of a substrate

Method for detecting the transition between different materials in semiconductor structures

Method for manufacturing a rate-of-rotation sensor

Method for manufacturing a sensor

Method for manufacturing micro-mechanical components using selective anodization of silicon

Sensor element

Micromechanical acceleration or coriolis rotation-rate sensor

Plasma etching equipment

Micromechanical component and method for producing same

Methods for plasma etching of silicon

Plasma etching method having pulsed substrate electrode power

Plasma etching installation

Method for applying a protecting lacquer on a wafer

Electronic sensor apparatus for detecting chemical or biological species, microfluidic apparatus comprising such a sensor apparatus, and method for producing the sensor apparatus and method for producing the microfluidic apparatus

Micro-dosing pump having a rotatable valve disk driven by a magnetized actuator disk

Micromechanical component and corresponding method for its manufacture

Holding device, in particular for fixing a semiconductor wafer in a plasma etching device, and method for supplying heat to or dissipating heat from a substrate

Microelectromechanical systems encapsulation process with anti-stiction coating

Method for producing porous microneedles and their use

Device and method for anisotropic plasma etching of a substrate, a silicon body in particular

Sensor and method for manufacturing a sensor

Device and method for determining the lateral undercut of a structured surface layer

Device and method for etching a substrate using an inductively coupled plasma

Device and method for the high-frequency etching of a substrate using a plasma etching installation and device and method for igniting a plasma and for pulsing the plasma out put or adjusting the same upwards

LAERMER FRANZ

Microneedles to be placed in the skin for the transdermal application of pharmaceuticals

Method for detecting the state of a tire

BUCK THOMAS

Microphone component and method for operating same

SCHOLTEN DICK

Manufacturing method for a porous microneedle array and corresponding porous microneedle array and corresponding substrate composite

REICHENBACH FRANK

Component having a micromechanical microphone structure, and method for its production

DIAMOND BRETT M

Epitaxial silicon CMOS-MEMS microphones and method for manufacturing