Inventor

VENTZEK PETER L G

US40 patents

⚠️ This page may combine multiple inventors who share the name “VENTZEK PETER L G”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

VENTZEK PETER L G

TOKYO ELECTRON LTD

Plasma processing system with synchronized signal modulation

Method for using heated substrates for process chemistry control

Methods for high precision etching of substrates

Solid state source introduction of dopants and additives for a plasma doping process

Radio frequency (RF) power coupling system utilizing multiple RF power coupling elements for control of plasma properties

Method of treating a mask layer prior to performing an etching process

Methods for high precision plasma etching of substrates

Methods for high precision plasma etching of substrates

Plasma processing apparatus and measurement method

System and method for controlling plasma density

Method of treating a mask layer prior to performing an etching process

Method of treating a mask layer prior to performing an etching process

RLSA CVD deposition control using halogen gas for hydrogen scavenging

Ultra-localized and plasma uniformity control in a plasma processing system

Plasma processing apparatus and plasma processing method

Hollow cathode device and method for using the device to control the uniformity of a plasma process

Self-limiting cyclic etch method for carbon-based films

Integrated induction coil and microwave antenna as an all-planar source

Plasma tuning rods in microwave resonator plasma sources

Plasma tuning rods in microwave resonator processing systems

FREESCALE SEMICONDUCTOR INC

Method of forming semiconductor device having nanotube structures

Method for removing metal foot during high-k dielectric/metal gate etching

Charge-free layer by layer etching of dielectrics

Laterally grown nanotubes and method of formation

Laterally grown nanotubes and method of formation

Method for etching a quartz layer in a photoresistless semiconductor mask

Deposition and patterning of boron nitride nanotube ILD

Thin-film capacitor with a field modification layer

Thin-film capacitor with a field modification layer and methods for forming the same

HOLLAND JOHN PATRICK

Semiconductor processing system having multiple decoupled plasma sources

E-beam enhanced decoupled source for semiconductor processing

E-beam enhanced decoupled source for semiconductor processing

Semiconductor processing system having multiple decoupled plasma sources

MOTOROLA INC

Method and apparatus for forming a layer on a substrate

Method and apparatus for forming a layer on a substrate

ZHAO JIANPING

Plasma tuning rods in microwave resonator plasma sources

Plasma tuning rods in microwave processing systems

DENPOH KAZUKI

Hollow cathode device and method for using the device to control the uniformity of a plasma process

LAM RES CORP

Semiconductor processing system having multiple decoupled plasma sources

KOSHIISHI AKIRA

Semiconductor processing system with source for decoupled ion and radical control