Inventor

SINGH HARMEET

US132 patents

⚠️ This page may combine multiple inventors who share the name “SINGH HARMEET”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

SINGH HARMEET

LAM RES CORP

Sub-pulsing during a state

Ion beam etching system

Heating plate with planar heater zones for semiconductor processing

Edge gas injection for critical dimension uniformity improvement

Integrating atomic scale processes: ALD (atomic layer deposition) and ALE (atomic layer etch)

Integrating atomic scale processes: ALD (atomic layer deposition) and ALE (atomic layer etch)

Method to etch non-volatile metal materials

Method to etch non-volatile metal materials

In-situ pre-coating of plasma etch chamber for improved productivity and chamber condition control

Electrostatic chuck including declamping electrode and method of declamping

In-situ pre-coating of plasma etch chamber for improved productivity and chamber condition control

Photoresist design layout pattern proximity correction through fast edge placement error prediction via a physics-based etch profile modeling framework

Integrating atomic scale processes: ALD (atomic layer deposition) and ale (atomic layer etch)

Adjusting substrate temperature to improve CD uniformity

Ion beam etching system

Heating plate with planar heater zones for semiconductor processing

Heating plate with planar heater zones for semiconductor processing

Internal plasma grid for semiconductor fabrication

Methods and apparatus for tuning a set of plasma processing steps

In-situ cleaning of a polymer coated plasma processing chamber

In-situ cleaning of a polymer coated plasma processing chamber

Substrate support with thermal zones for semiconductor processing

Photoresist design layout pattern proximity correction through fast edge placement error prediction via a physics-based etch profile modeling framework

Integrating atomic scale processes: ALD (atomic layer deposition) and ALE (atomic layer etch)

Sub-pulsing during a state

Substrate supports with multi-layer structure including independent operated heater zones

Internal plasma grid for semiconductor fabrication

Controlling ion energy within a plasma chamber

Sub-pulsing during a state

Sub-pulsing during a state

Heating plate with heating zones for substrate processing and method of use thereof

SINGH HARMEET

Heating plate with planar heating zones for semiconductor processing

Methods and apparatus for atomic layer etching

Heating plate with planar heater zones for semiconductor processing

Methods of fault detection for multiplexed heater array

Apparatus for atomic layering etching

QTERA CORP

Temperature-compensated optical filter assemblies and related methods

Compact wavelength-independent wavelength-locker for absolute wavelength stability of a laser diode

Ultra-stable optical wavelength division multiplexer/demultiplexer

3M INNOVATIVE PROPERTIES CO

Waveguide narrowband rejection filter

Incremental method of producing multiple UV-induced gratings on a single optical fiber

HOLLAND JOHN PATRICK

Semiconductor processing system having multiple decoupled plasma sources

E-beam enhanced decoupled source for semiconductor processing

UNIV MARYLAND

Simultaneous measurement of temperature and strain using optical sensors

VALCORE JR JOHN C

Methods and apparatus for synchronizing RF pulses in a plasma processing system

ALTRO SMART INC

Lock set

GAFF KEITH WILLIAM

Adjusting substrate temperature to improve CD uniformity

OPTOVIA CORP

Integrated polarization coupler

COOPERBERG DAVID J

Tunable multi-zone gas injection system

JDS UNIPHASE CORP

Optical multiplexer