Inventor

DZILNO DMITRY A

US37 patents

⚠️ This page may combine multiple inventors who share the name “DZILNO DMITRY A”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

DZILNO DMITRY A

APPLIED MATERIALS INC

Methods and apparatus for controlling RF parameters at multiple frequencies

Shaped electrodes for improved plasma exposure from vertical plasma source

Position and temperature monitoring of ALD platen susceptor

Phased array modular high-frequency source

Phased array modular high-frequency source

Phased array modular high-frequency source

Position and temperature monitoring of ALD platen susceptor

Plasma source with ceramic electrode plate

Vertically adjustable plasma source

High temperature bipolar electrostatic chuck

Methods and apparatus for controlling RF parameters at multiple frequencies

Geometrically selective deposition of dielectric films utilizing low frequency bias

Microwave plasma source for spatial plasma enhanced atomic layer deposition (PE-ALD) processing tool

Microwave plasma source for spatial plasma enhanced atomic layer deposition (PE-ALD) processing tool

Real time bias detection and correction for electrostatic chuck

Paired dynamic parallel plate capacitively coupled plasmas

RF power source operation in plasma enhanced processes

Real time bias detection and correction for electrostatic chuck

Shaped electrodes for improved plasma exposure from vertical plasma source

Paired dynamic parallel plate capacitively coupled plasmas

Non-contact sheet resistance measurement of barrier and/or seed layers prior to electroplating

Film measurement

Vertically adjustable plasma source

High temperature bipolar electrostatic chuck

Bipolar electrostatic chuck to limit DC discharge

Power supply signal conditioning for an electrostatic chuck

Substrate transfer structure

Multi-pressure bipolar electrostatic chucking

Plasma source with floating electrodes

Bipolar esc with balanced RF impedance

Spatial atomic layer deposition chamber with plasma pulsing to prevent charge damage

Fast and continuous eddy-current metrology of a conductive film

Temperature control apparatus including groove-routed optical fiber heating, substrate temperature control systems, electronic device processing systems, and processing methods

Magnetically coupled RF filter for substrate processing chambers

Multi-zone heater control for wafer processing equipment

RF power delivery architecture with switchable match and frequency tuning

PORTHOUSE KEITH BRIAN

Methods and apparatus for processing substrates using model-based control