Inventor

SHIBUYA AKINORI

JP50 patents

⚠️ This page may combine multiple inventors who share the name “SHIBUYA AKINORI”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

SHIBUYA AKINORI

FUJIFILM CORP

Pattern forming method, actinic ray-sensitive or radiation-sensitive resin composition, resist film, manufacturing method of electronic device, electronic device and compound

Pattern forming method and actinic ray-sensitive or radiation-sensitive resin composition for use in the method

Precursor composition, photosensitive resin composition, method for producing precursor composition, cured film, method for producing cured film, and semiconductor device

Resin, composition, cured film, method for manufacturing cured film and semiconductor device

Method of forming pattern, actinic-ray- or radiation-sensitive resin composition, actinic-ray- or radiation-sensitive film, process for manufacturing electronic device and electronic device

Actinic ray-sensitive or radiation-sensitive resin composition, and, resist film, pattern forming method, electronic device manufacturing method, and electronic device, each using the composition

Polyimide precursor composition, photosensitive resin composition, cured film, method for producing cured film, a semiconductor device, and method for producing polyimide precursor composition

Positive photosensitive composition, polymer compound used for the positive photosensitive composition, production method of the polymer compound, and pattern forming method using the positive photosensitive composition

Positive working resist composition and pattern forming method

Positive photosensitive composition, polymer compounds for use in the positive photosensitive composition, manufacturing method of the polymer compounds, compounds for use in the manufacture of the polymer compounds, and pattern-forming method using the positive photosensitive composition

Photosensitive composition

Photosensitive composition and novel compound used therefor

Photosensitive resin composition, heterocyclic ring-containing polymer precursor, cured film, laminate, method for producing cured film, and semiconductor device

Photosensitive resin composition, polymer precursor, cured film, laminate, method for producing cured film, and semiconductor device

Pattern forming method, method for manufacturing electronic device, and electronic device

Positive resist composition and pattern forming method using the same

Actinic ray-sensitive or radiation-sensitive resin composition, pattern forming method, method for manufacturing electronic device, and electronic device

Polymerizable composition and negative-working planographic printing plate precursor using the same

Composition for forming adhesive film for imprinting, adhesive film, laminate, method for producing cured product pattern, and method for manufacturing circuit substrate

Curable composition for imprinting, cured product, pattern forming method, lithography method, pattern, mask for lithography, and polymerizable composition for imprinting

Composition, adhesive film, laminate, method for producing cured product pattern, and method for manufacturing circuit substrate

Kit, composition for forming underlayer film for imprinting, laminate, and production method using the same

Active light sensitive or radiation sensitive resin composition, active light sensitive or radiation sensitive film, pattern forming method, method for manufacturing electronic device, and electronic device

Laminate, method for manufacturing laminate, semiconductor device, and method for manufacturing the semiconductor device

Lithographic printing plate precursor

Photosensitive composition

Actinic-ray- or radiation-sensitive resin composition, actinic-ray- or radiation-sensitive film and method of forming pattern

Actinic ray- or radiation-sensitive resin composition, actinic ray- or radiation-sensitive film and method of forming pattern

Photosensitive composition and image recording method using the same

YAMAGUCHI SHUHEI

Actinic-ray- or radiation-sensitive resin composition, compound and method of forming pattern using the composition

Actinic-ray- or radiation-sensitive resin composition, actinic-ray- or radiation-sensitive film and method of forming pattern

Actinic ray-sensitive or radiation-sensitive resin composition, pattern forming method using the same, polymerizable compound and polymer compound obtained by polymerizing the polymerizable compound

Actinic-ray- or radiation-sensitive resin composition, compound and method of forming pattern using the composition

KATAOKA SHOHEI

Actinic-ray-sensitive or radiation-sensitive resin composition, resist film and pattern forming method each using the composition, method for preparing electronic device, and electronic device

Actinic-ray- or radiation-sensitive resin composition and method of forming pattern using the composition

FUJI PHOTO FILM CO LTD

Photosensitive composition

Compound, photosensitive composition, lithographic printing plate precursor, and method of forming image

MATSUDA TOMOKI

Actinic-ray- or radiation-sensitive resin composition, actinic-ray- or radiation-sensitive film therefrom and method of forming pattern using the composition

Actinic-ray- or radiation-sensitive resin composition, actinic-ray- or radiation-sensitive film therefrom and method of forming pattern using the composition

ENOMOTO YUICHIRO

Method of forming pattern using actinic-ray or radiation-sensitive resin composition, and pattern

Pattern forming method, actinic ray-sensitive or radiation-sensitive resin composition and resist film

NIPPON TELEGRAPH & TELEPHONE

Locating system and method for determining positions of objects

SHIBUYA AKINORI

Actinic-ray- or radiation-sensitive resin composition and method of forming pattern using the same

KATO TAKAYUKI

Actinic ray-sensitive or radiation-sensitive resin composition and pattern forming method using the same

SATO KENICHIRO

Actinic ray-sensitive or radiation-sensitive resin composition and pattern forming method using same

IIZUKA YUSUKE

Actinic ray-sensitive or radiation-sensitive resin composition, and actinic ray-sensitive or radiation-sensitive film and pattern forming method using the same composition

TOMEBA HISAMITSU

Actinic ray-sensitive or radiation-sensitive resin composition, and resist film and pattern forming method using the same

YAMAMOTO KEI

Positive resist composition and pattern forming method using the same

FUKUHARA TOSHIAKI

Positive photosensitive composition and pattern forming method using the same

TANGO NAOHIRO

Actinic ray-sensitive or radiation-sensitive resin composition and pattern forming method using the same