Inventor

TOKUNAGA HIKARU

JP17 patents

⚠️ This page may combine multiple inventors who share the name “TOKUNAGA HIKARU”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

TOKUNAGA HIKARU

NISSAN CHEMICAL CORP

Photocurable composition and method for producing semiconductor device

Protective film-forming composition

Resist underlayer film-forming composition using carbon-oxygen double bond

Photocurable composition and method for producing semiconductor device

Resist underlayer film-forming composition

Composition for forming resist underlayer film with improved film density

Multi-level substrate coating film-forming composition containing plasma-curable compound based on unsaturated bonds between carbon atoms

Resist underlayer film-forming composition including cyclic carbonyl compound

Resist underlayer film-forming composition containing amide solvent

Stepped substrate coating composition containing compound having curable functional group

Resist underlayer film forming composition using a fluorene compound

Crosslinkable compound-containing photocurable stepped substrate-coating composition

Composition for forming film protecting against aqueous hydrogen peroxide solution

Resist underlayer film-forming composition

Stepped substrate-coating composition containing polyether resin having photocrosslinkable group

NISSAN CHEMICAL IND LTD

Resist underlayer film-forming composition containing indolocarbazole novolak resin

Resist underlayer film-forming composition containing indolocarbazole novolak resin